公开(公告)号：DE3683464D1

公开(公告)日：1992-02-27

申请号：DE3683464

申请日：1986-10-07

Applicant: IBM

Inventor： CHION KAOLIN ,  CHOW MING-FEA ,  MOREAU WAYNE ,  SNYDER NANCY WARD

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: The dissolution rate in alkaline developer solutions of image-wise exposed photoresist systems based on diazoquinone sensitized polyamic acid is reduced to prepare relief images of fine line resolution by reducing the acidity of the polyamic acid prior to exposure.