公开(公告)号：JP2000286193A

公开(公告)日：2000-10-13

申请号：JP2000065056

申请日：2000-03-09

Applicant: IBM

Inventor： MICHAEL S GORDON ,  JAMES D ROCKROLL ,  CHRIS F ROBINSON ,  PETRIC PAUL F

IPC: G03F7/20 ,  H01J37/04 ,  H01J37/147 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and method for aligning charged particle beam in accordance with a curved line variable axis. SOLUTION: A key-hole type silt aperture 150 that has been created in a size for demarcating a desired deflection beam track, such as a planar curved line track and is oriented is provided at each deflector 110 of a charged particle beam system. A beam is statically deflected to the maximum deflection by all the deflectors 110 and in front of a specific slit aperture along the path of the charged particle beam, then scanning is made in a direction in parallel with a direction for crossing the direction of static deflection, at the same time, the current of the charged particle beam captured by the end part of each slit aperture 150 is recorded successively. Based on the recorded, captured beam current, the deflector is aligned or a driver current (or voltage) or both are corrected. A correction sequence is repeated for calibration, deflection/axis correction, beam center alignment, and deflection gain and axis correction parameter adjustment.