Abstract:
A method of detecting local mechanical stress in integrated devices is provided, the method comprising: enabling the detection of a photo voltage difference between a scan probe device (14) and a surface portion (30) of an integrated device (18), the scan probe device (14) being configured to deflect in response to the photo voltage difference; measuring the deflection of the scan probe device (14) in response to the photo voltage difference between the scan probe device (14) and the surface portion (30) of the integrated device (18); and calculating a local stress level within the integrated device by determining a local work function of the surface portion (30) of the integrated device (18) based upon the deflection of the scan probe device (14).