公开(公告)号：JP2002244300A

公开(公告)日：2002-08-30

申请号：JP2002016785

申请日：2002-01-25

Applicant: IBM

Inventor： PHILIP JOE BROCK ,  DAWSON DANIEL JOSEPH ,  ITO HIROSHI ,  WALLRAFF GREGORY MICHAEL

IPC: G03F7/025 ,  C08F20/04 ,  C08F20/10 ,  C08F20/42 ,  C08F20/54 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic photoresist composition usable as a chemically amplifier photoresist. SOLUTION: The composition is substantially transparent to deep UV, that is, radiation of