1.
    发明专利
    未知

    公开(公告)号:DE3766031D1

    公开(公告)日:1990-12-13

    申请号:DE3766031

    申请日:1987-07-24

    Applicant: IBM

    Abstract: Method of controlling the residual resistivity of an electrolessly deposited metal by first, determining the mathematical relationship between the residual resistivity of the deposited metal and its rate of deposition and second, depositing said metal at a rate to produce a predetermined residual resistivity.

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