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    STAMP DEVICE WHICH PRINTS PATTERN ON SURFACE OF SUBSTRATE
    2.
    发明专利
    STAMP DEVICE WHICH PRINTS PATTERN ON SURFACE OF SUBSTRATE 失效

    公开(公告)号：JP2001205909A

    公开(公告)日：2001-07-31

    申请号：JP2000396889

    申请日：2000-12-27

    Applicant: IBM

    Inventor： BRUNO MICHEL ,  SCHMIDT HEINZ ,  DELAMARCHE EMMANUEL ,  BIETSCH ALEXANDER

    IPC: B41K1/02 ,  B41K3/00 ,  B41K3/04 ,  B41M1/02 ,  B41N10/04 ,  G03F7/00

    Abstract: PROBLEM TO BE SOLVED: To perform a printing of a large area, which is mechanized, regarding a stamp device which prints a pattern on the surface of a substrate. SOLUTION: This stamp device which prints a pattern on the surface of the substrate 4 is equipped with a carrier layer 1 having rigidity. The carrier layer 1 is equipped with a first surface and a second surface. On the first surface, a layer 3 on which the pattern is formed, made of a first material, is provided. On the second surface, a soft layer 5 made of a material which is softer than the first material is provided. The layer 3 on which the pattern is formed and the soft layer 5 function while cooperating, and even when a contact surface formed between the stamp and the substrate 4 is not accurately smooth and flat, a printing of a high quality is realized.

    MULTILAYER MICROFLUIDIC PROBE HEAD AND METHOD OF FABRICATION THEREOF
    5.
    发明申请
    MULTILAYER MICROFLUIDIC PROBE HEAD AND METHOD OF FABRICATION THEREOF 审中-公开
    多层微流体探头及其制造方法

    公开(公告)号：WO2010128483A3

    公开(公告)日：2011-07-21

    申请号：PCT/IB2010052018

    申请日：2010-05-07

    Applicant: IBM ,  DELAMARCHE EMMANUEL ,  DRECHSLER UTE ,  LOVCHIK ROBERT

    Inventor： DELAMARCHE EMMANUEL ,  DRECHSLER UTE ,  LOVCHIK ROBERT

    IPC: B01J19/00 ,  B01L3/00 ,  B01L3/02

    CPC classification number: B01J19/0046 ,  B01J2219/00367 ,  B01J2219/00527 ,  B01J2219/00743 ,  B01L3/0241 ,  B01L3/502707 ,  B01L2300/0874 ,  B01L2300/0887 ,  Y10T29/494 ,  Y10T137/0318 ,  Y10T137/0402 ,  Y10T137/2224 ,  Y10T137/8359 ,  Y10T137/8593 ,  Y10T137/87153 ,  Y10T137/87885

    Abstract: The invention is directed to a multilayer microfluidic probe (MFP) head (100). The head typically comprises a first (110) and second (120) layers facing each others, and at least one tubing port (182), extending from the first layer (110). The first layer comprises one or more via (112), whereby fluid communication is enabled through the first layer towards the second layer. The second layer comprises at least one microchannel (124), relaying fluid communication to an aperture (122). Such a multilayered MFP head is easier to fabricate than heads made with unitary construction. In particular, a microchannel can advantageously be engraved a groove (124) at the level of the interface between the two layers. The MFP head can further be interfaced with tubing using e.g. a standard fitting for tubing port. The invention has substantial potential for e.g. patterning continuous and discontinuous patterns of biomolecules on surfaces as well as for direct processing of resist materials in a non- contact mode.

    Abstract translation: 本发明涉及一种多层微流体探针（MFP）头（100）。 头部通常包括彼此面对的第一（110）和第二（120）层，以及从第一层（110）延伸的至少一个管口（182）。 第一层包括一个或多个通孔（112），由此通过第一层朝向第二层的流体连通。 第二层包括至少一个微通道（124），将流体连通中继到孔（122）。 这样的多层MFP头比用单一结构制造的头更容易制造。 特别地，微通道可以有利地在两层之间的界面的水平刻划凹槽（124）。 MFP头可以进一步与例如管道连接。 油管口的标准配件。 本发明具有实质的潜力。 在表面上形成生物分子的连续和不连续图案，以及在非接触模式下直接处理抗蚀剂材料。

    System and method for determining osmolarity of fluid
    6.
    发明专利
    System and method for determining osmolarity of fluid 有权
    用于确定流体易磁化的系统和方法

    公开(公告)号：JP2013037010A

    公开(公告)日：2013-02-21

    申请号：JP2012228505

    申请日：2012-10-16

    Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Machines Corporation

    Inventor： NATARAJAN GOVINDARAJAN ,  HUMENIK JAMES N ,  WIWEL TIMOTHY M ,  ECKBERG ERIC A ,  DELAMARCHE EMMANUEL ,  PARTINGTON SCOTT ,  MCGRODDY-GOETZ KATHLEEN A ,  TRIVELLA MARCO G ,  PERRERA CHRISTOPHER F

    IPC: G01N27/06

    CPC classification number: G01N13/04 ,  A61B2010/0067

    Abstract: PROBLEM TO BE SOLVED: To provide a system and method for determining the osmolarity of a fluid.SOLUTION: A system 200 for determining the osmolarity of a fluid comprises: a holder 205 which has a substantially planar layer 225, a receiving portion 235 disposed on the layer, at least one shelf 230 disposed beneath the layer, and a hole 240 within a perimeter of the receiving portion and extending through the layer; and a guide 210 having a through hole 260 and an external shape substantially corresponding to an internal shape of the receiving portion. The hole and the through hole are aligned with each other, and are arranged to be aligned with a test site, when the guide is received in the receiving portion. The system further comprises electrodes 270 disposed in the vicinity of the at least one shelf.

    Abstract translation: 要解决的问题：提供用于确定流体的渗透压浓度的系统和方法。 解决方案：用于确定流体的渗透压浓度的系统200包括：保持器205，其具有基本平坦的层225，设置在层上的接收部分235，设置在层下方的至少一个搁架230和孔 240在所述接收部分的周边内并延伸穿过所述层; 以及具有通孔260的引导件210和与接收部分的内部形状基本对应的外部形状。 孔和通孔彼此对准，并且当引导件被容纳在接收部分中时被布置成与测试位置对齐。 系统还包括设置在至少一个搁架附近的电极270。 版权所有（C）2013，JPO＆INPIT

    METHOD FOR SELECTIVELY ETCHING SAM SUBSTRATE
    9.
    发明专利
    METHOD FOR SELECTIVELY ETCHING SAM SUBSTRATE 审中-公开

    公开(公告)号：JP2002294469A

    公开(公告)日：2002-10-09

    申请号：JP2002084108

    申请日：2002-03-25

    Applicant: IBM

    Inventor： BIETSCH ALEXANDER ,  DELAMARCHE EMMANUEL ,  GEISSLER MATTHIAS ,  MICHEL BRUNO ,  SCHMIDT HEINZ

    IPC: C23F1/00 ,  C23F1/02 ,  C23F1/34 ,  C23F1/40 ,  H01L21/768

    Abstract: PROBLEM TO BE SOLVED: To provide a fine structure by etching a substrate having a region covered with self-assembly monomolecule(SAM). SOLUTION: A wet etching system for selectively forming a pattern on the substrate having the region covered with SAM and controlling an etching profile, includes (a) a fluid etching solution, and (b) additives having higher affinity for the region covered with the SAM than for the other region. The method for selectively forming the pattern on the substrate having the region covered with the SAM and controlling the etching profile, includes (a) a step of providing a fluid etching solution, (b) a step of adding the additives having the higher affinity for the region covered with SAM than for the other region to the above etching solution, and (c) a step of etching the above substrate with the above fluid etching solution containing the above additives.

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