公开(公告)号：EP1634122A4

公开(公告)日：2009-02-11

申请号：EP04752670

申请日：2004-05-19

Applicant: IBM

Inventor： FONSECA CARLOS A ,  BUKOFSKY SCOTT J ,  LAI KAFAI

IPC: G03C5/00 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/705 ,  G03F7/70466 ,  G03F7/70625 ,  G03F7/70641

Abstract: A method of evaluating process effects of multiple exposure photolithographic processes by first determining a set of expected images for each exposure step or process of the multiple exposure process individually (SET1, SET2) and then obtaining a composite set of images (FINALSET) by sequentially perturbing images from a first or previous exposure step (SET1) by weighted images from the subsequent exposure step (SET2). Preferably, the expected images are determined by simulation in the form of normalized aerial images over a range of defocus for each exposure step, and the weighting factor used is the dose-ratio of the subsequent exposure dose to the prior step exposure dose. The resulting composite set of images may be used to evaluate multiple exposure processes, for example, to provide an estimate of yield for a given budget of dose and focus errors, or alternatively, to provide specifications for tool error budgets required to obtain a target yield.

公开(公告)号：DE602004023941D1

公开(公告)日：2009-12-17

申请号：DE602004023941

申请日：2004-05-19

Applicant: IBM

Inventor： FONSECA CARLOS A ,  BUKOFSKY SCOTT J ,  LAI KAFAI

IPC: G03C5/00 ,  G03F7/20 ,  G03F9/00