公开(公告)号：CA2006266A1

公开(公告)日：1990-09-10

申请号：CA2006266

申请日：1989-12-20

Applicant: IBM

Inventor： GALEUCHET YVAN ,  GRAF VOLKER ,  HEUBERGER WILHELM ,  ROENTGEN PETER

IPC: H01L29/201 ,  C30B29/40 ,  H01L21/20 ,  H01L21/205 ,  H01L21/338 ,  H01L29/775 ,  H01L29/812 ,  H01S5/12 ,  H01S5/223 ,  H01S5/227 ,  H01S5/30 ,  H01S5/32 ,  H01S5/323 ,  H01S5/34 ,  H01S5/40

Abstract: A method, and devices produced therewith, for the epitaxial growth of sub-micron semiconductor structures with at least one crystal plane dependently grown, buried active layer (24) consisting of a III-V compound. The active layer (24) and adjacent embedding layers (23, 25) form a heterostructure produced in a one-step growth process not requiring removal of the sample from the growth chamber inbetween layer depositions. The layers of the structure are grown on a semiconductor substrate (21) having a structured surface exposing regions of different crystal orientation providing growth- and no-growth-planes for the selective growth process. The method allows the production of multiple, closely spaced active layers and of layers consisting of adjoining sections having different physical properties.

公开(公告)号：CA2006266C

公开(公告)日：1993-01-12

申请号：CA2006266

申请日：1989-12-20

Applicant: IBM

Inventor： GALEUCHET YVAN ,  GRAF VOLKER ,  HEUBERGER WILHELM ,  ROENTGEN PETER

IPC: H01L29/201 ,  C30B29/40 ,  H01L21/20 ,  H01L21/205 ,  H01L21/338 ,  H01L29/775 ,  H01L29/812 ,  H01S5/12 ,  H01S5/223 ,  H01S5/227 ,  H01S5/30 ,  H01S5/32 ,  H01S5/323 ,  H01S5/34 ,  H01S5/40 ,  H01L21/36

Abstract: A method, and devices produced therewith, for the epitaxial growth of sub-micron semiconductor structures with at least one crystal plane dependently grown, buried active layer (24) consisting of a III-V compound. The active layer (24) and adjacent embedding layers (23, 25) form a heterostructure produced in a one-step growth process not requiring removal of the sample from the growth chamber inbetween layer depositions. The layers of the structure are grown on a semiconductor substrate (21) having a structured surface exposing regions of different crystal orientation providing growth- and no-growth-planes for the selective growth process. The method allows the production of multiple, closely spaced active layers and of layers consisting of adjoining sections having different physical properties.