Abstract:
A superconducting Josephson junction tunnel device having in particular lead alloy electrodes (Pb-In and Pb-In-Sn) and a very precisely defined and dense tunnel barrier comprising an oxide of the lead alloy electrode. Such devices can be thermally cycled between liquid helium temperatures and room temperatures, and provide large tunnelling currents.
Abstract:
A method for forming reactive layers on materials where the final thickness of the reactive layer is independent of time after an initial time period in which the final thickness is attained. Films are grown by a process, such as oxidation, and are removed simultaneously by a process, such as sputtering. The parameters of the growth process and removal process are initially fixed so that at a desired final thickness, the growth rate is equal to the removal rate. When this steady-state equilibrium is reached, the thickness of the reactive layer will remain constant, independent of time. The reactive layer can be grown to the desired thickness by this method, or a thicker layer can be reduced to a lesser final thickness by this method. Very small (less than 50A) films of excellent quality can be made.
Abstract:
A superconducting Josephson junction tunnel device having in particular lead alloy electrodes (Pb-In and Pb-In-Sn) and a very precisely defined and dense tunnel barrier comprising an oxide of the lead alloy electrode. Such devices can be thermally cycled between liquid helium temperatures and room temperatures, and provide large tunnelling currents.