公开(公告)号：US3729249A

公开(公告)日：1973-04-24

申请号：US3729249D

申请日：1968-07-12

Applicant: IBM

Inventor： HABEGGER M ,  SINCERBOX G

IPC: G03H1/10 ,  G02B27/00

CPC classification number: G03H1/10 ,  Y10S359/90

Abstract: Interference pattern recording of large objects or scenes having dimensions exceeding the coherence lengths of available light sources is accomplished. The recording is performed by illuminating the storage medium with a plurality of reference beams all of which are collinear and the scattered radiation from the object. A path length difference not exceeding and preferably slightly less than the coherence length of the radiation sources is introduced into each successive reference beam.

Abstract translation: 实现了具有超过可用光源的相干长度的大对象或场景的干涉图案记录。 通过用多个共线的参考光束和来自物体的散射的辐射来照射存储介质来进行记录。 路径长度差不超过并优选略小于辐射源的相干长度被引入到每个连续的参考光束中。

公开(公告)号：BR7704576A

公开(公告)日：1978-04-04

申请号：BR7704576

申请日：1977-07-12

Applicant: IBM

Inventor： HABEGGER M ,  DAVIS D ,  YOURKE H

IPC: H01L21/027 ,  G01D5/39 ,  H01L21/00 ,  H01L21/68

公开(公告)号：BR7504006A

公开(公告)日：1976-07-06

申请号：BR7505151

申请日：1975-06-26

Applicant: IBM

Inventor： DAVIS D ,  WEBER E ,  WOODARD O ,  HABEGGER M ,  MOORE R

IPC: G05D3/12 ,  H01J37/304 ,  H01L21/027 ,  G01N23/00

Abstract: 1508903 Wave energy position finding INTERNATIONAL BUSINESS MACHINES CORP 23 May 1975 [27 June 1974] 22919/75 Heading G1A [Also in Division H4] The position of a registration mark on a target (e.g. a semi-conductor wafer) is detected by irradiating the mark with a beam of charged particles. The present invention is stated to be an improvement over the system described in Specification 1480562. As described, each mark 42, Fig. 17, consists of vertical and horizontal bars 44, 43 (raised portions or depressions), the position of the mark being determined from 20 horizontal (X) scans followed by 20 vertical (Y) scans, successive scans being in opposite directions. Peak signals corresponding to the edges of a bar are detected and applied to threshold circuitry which is updated during each scan. Diodes 45, 46 and 45', 46' detect radiation during X, Y scans respectively, the arrangement including extra diodes 47 and an extra lead going to a respective preamplifier 48-66 for noise suppression. X-scanning: The outputs 70, 71 from diodes 45, 46 contain peaks 72 &c. corresponding to the edges of a bar 44. These signals pass to a differential amplifier 69 via balancers 58, 60 which compensate for the fact that the mark being scanned will be nearer one diode than the other. The output 85, Fig. 13, from amplifier 69 contains positive and negative peaks 86, 87 corresponding to the edges of a bar. The signals are shown without any ramp component. Such component is removed in filter 89 to leave the peak signals plus a substantially constant residual baseline voltage, Figs. 14 and 15 (not shown). The output from filter 89 is fed via an AGC circuit 90 to positive and negative peak detectors 99, 100 and an averaging circuit 122. During the first scan, outputs 103, 104 from detectors 99, 100 are used to set the gain levels in AGC 90 for subsequent scans so as to compensate for the surface conditions on the wafer in the region of the mark being scanned. At the end of the first scan the contents of 99, 100, 122 are passed to stores 143, 128, 136 the outputs of which are combined by means of resistors 144, 140, 137 to produce positive and negative threshold signals 134 and 141 which are correlated with the residual baseline voltage. These signals pass via differential amplifiers 135, 142 to act as threshold levels for voltage comparators 118, 119 receiving signals from AGC 90 via a switch 116 (blocked during the first scan). During the second scan, fresh data is fed to detectors 99 &c. and stores 143 &c. and switch 116 is enabled to pass the output of AGC 90 to the comparators, outputs of which are however not used until the third scan. During the third and subsequent scans, comparators 118, 119 produce signals whenever the signals from AGC 90 cross the levels set during the preceding scan by amplifiers 135, 142. The ORed outputs from 118, 119 enable a gate 151, so that clockpulses 153 pass to a feedback channel 152 and a computer 19 which uses the detected-edge signals, averaged over the last 18 scans, to determine the location of mark 42. Since successive scans occur in opposite directions, stores 143, 136 incorporate means for reversing the sign of their outputs, so that detectors 99, 100 continue to detect the same edge of a bar 44 during successive scans. The Y-scan is then performed in the same way. The various blocks of Fig. 2 are described in detail with reference to Figs. 3-9 (not shown).

公开(公告)号：SE356606B

公开(公告)日：1973-05-28

申请号：SE473770

申请日：1970-04-07

Applicant: IBM

Inventor： HABEGGER M ,  LIPP J

IPC: G02F1/31 ,  G02B27/28

Abstract: 1289285 Light deflection apparatus INTERNATIONAL BUSINESS MACHINES CORP 12 March 1970 [7 April 1969] 12040/70 Heading G2J [Also in Division B6] Light deflection apparatus in which astigmatic aberrations caused by the propagation of extraordinary rays through birefringent elements is avoided comprises a transparent medium (e.g. an oil bath) of refractive index Á enclosing two negative birefringent plates 20, 21 of ordinary refractive index Á (e.g. calcite) and two adjustable isotropic plates 22, 23 of refractive index less than Á (e.g. sodium fluoride) arranged as in Fig.3, and polarizing means (not shown) located on the side of plate 20 remote from plate 22 to direct on to plate 20 light polarized either in the ordinary or in the extraordinary sense at an angle of incidence greater than the critical angle for the extraordinary refractive index. The optic axes 24, 25 of plates 20, 21 are disposed in perpendicular planes and the polarizing means (e.g. a KDP crystal) presents a light beam 26 having a linear polarization in one of two orthogonal states. When beam 26 has a polarization in a plane corresponding to the plane of axis 24, it encounters the lower (extraordinary) refractive index of plate 20 and is thus reflected as beam 27; this encounters the higher (ordinary) refractive index p of plate 21 and passes through without refraction to be reflected at the incident face of plate 23 as beam 28. If the polarization of beam 26 is in a perpendicular plane it encounters first the higher index Á of plate 20 and then the lower index of plate 21. To ensure that both possible output beams have the same pathlength, an optical element 34 of refractive index greater than Á is inserted in the path of beam 31, and each output beam is controlled only by altering the difference between distances h 1 and h 2 (which may be adjusted so that plate 23 can be formed as a coating on plate 21). Any number of such arrangements may be assembled, n such arrangements in any one plane yielding 2 n possible output beams Fig. 4 (not shown). Alternative arrangements are illustrated in Figs. 5 and 7 (not shown). A number of the above arrangements 85-88 (Fig.8) may be assembled together with a laser input 80 and a number of telescoping lenses 90-95 in order to select a character from a matrix 82 and to position it at a desired location on an output medium 84.