公开(公告)号：DE69013709D1

公开(公告)日：1994-12-08

申请号：DE69013709

申请日：1990-01-11

Applicant: IBM

Inventor： HACKER NIGEL PATRICK ,  TYNDALL III GEORGE WILLIAM

IPC: H01L21/205 ,  C23C16/27 ,  C30B25/02 ,  C30B29/04 ,  H01L21/314 ,  C23C16/26 ,  C23C16/04

Abstract: Diamond films are deposited at substrates below temperatures of 400 DEG C by chemical vapour deposition using a high powered pulsed laser and a vapour which is an aliphatic carboxylic acid or an aromatic carboxylic anhydride.

公开(公告)号：DE69013709T2

公开(公告)日：1995-05-18

申请号：DE69013709

申请日：1990-01-11

Applicant: IBM

Inventor： HACKER NIGEL PATRICK ,  TYNDALL III GEORGE WILLIAM

IPC: H01L21/205 ,  C23C16/27 ,  C30B25/02 ,  C30B29/04 ,  H01L21/314 ,  C23C16/26 ,  C23C16/04

Abstract: Diamond films are deposited at substrates below temperatures of 400 DEG C by chemical vapour deposition using a high powered pulsed laser and a vapour which is an aliphatic carboxylic acid or an aromatic carboxylic anhydride.

公开(公告)号：DE68901974D1

公开(公告)日：1992-08-13

申请号：DE68901974

申请日：1989-01-05

Applicant: IBM

Inventor： DEKTAR JOHN LOUIS ,  HACKER NIGEL PATRICK

IPC: C07C381/12

公开(公告)号：DE3860953D1

公开(公告)日：1990-12-13

申请号：DE3860953

申请日：1988-01-22

Applicant: IBM

Inventor： HACKER NIGEL PATRICK ,  LARSON CARL ERIC

IPC: C08G59/18 ,  C07C67/00 ,  C07C325/00 ,  C07C381/12 ,  C08G59/00 ,  C08G59/68 ,  G03F7/029 ,  G03F7/031 ,  G03F7/027

Abstract: Alkyldiarylsulfonium salts of 9, 10,-dithiophenoxyanthracene as photoinitiators in resist compositions, such as epoxy resin formulations, particularly using long wavelength light.