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公开(公告)号：EP1851589A4
公开(公告)日：2009-08-19
申请号：EP06735757
申请日：2006-02-22
Applicant: IBM
Inventor： ALLEN ROBERT DAVID , BROCK PHILLIP JOE , GIL DARIO , HINSBERG WILLIAM DINAN , LARSON CARL ERIC , SUNDBERG LINDA KARIN , WALLRAFF GREGORY MICHAEL
IPC: G03C1/00
CPC classification number: G03F7/11 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111
Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 A/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: (I) wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is 10 preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
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Patent Agency Ranking
公开(公告)号：WO2006091648A2
公开(公告)日：2006-08-31
申请号：PCT/US2006006225
申请日：2006-02-22
Applicant: IBM , ALLEN ROBERT DAVID , BROCK PHILLIP JOE , GIL DARIO , HINSBERG WILLIAM DINAN , LARSON CARL ERIC , SUNDBERG LINDA KARIN , WALLRAFF GREGORY MICHAEL
Inventor： ALLEN ROBERT DAVID , BROCK PHILLIP JOE , GIL DARIO , HINSBERG WILLIAM DINAN , LARSON CARL ERIC , SUNDBERG LINDA KARIN , WALLRAFF GREGORY MICHAEL
IPC: G03C1/76
CPC classification number: G03F7/11 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111
Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 A/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: (I) wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is 10 preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
Abstract translation: 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包含至少一种溶剂和在含水碱性显影剂中具有至少3000A /秒的溶解速率的聚合物。 聚合物含有包含以下两种结构之一的六氟醇单体单元：（I）其中n是整数。 面漆材料可以用于光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。 面漆材料10优选不溶于水，因此特别适用于使用水作为成像介质的浸没式光刻技术。
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公开(公告)号：DE602006015428D1
公开(公告)日：2010-08-26
申请号：DE602006015428
申请日：2006-02-22
Applicant: IBM
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公开(公告)号：DE602006011049D1
公开(公告)日：2010-01-21
申请号：DE602006011049
申请日：2006-10-13
Applicant: IBM
Inventor： BROCK PHILIP JOE , CHA JENNIFER , GIL DARIO , LARSON CARL ERIC , SUNDBERG LINDA KARIN , WALLRAFF GREGORY
IPC: C09D129/00 , C09D131/04 , G03F7/00
Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises a polymer which is sparingly soluble or insoluble in water at a temperature of about 25° C. or below but soluble in water at a temperature of about 60° C. or above. The polymer contains poly vinyl alcohol monomer unit and a poly vinyl acetate or poly vinyl ether monomer unit having the following polymer structure: wherein R is an aliphatic or alicyclic radical; m and n are independently integers, and are the same or different; and p is zero or 1. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is particularly useful in immersion lithography techniques using water as the imaging medium. The topcoat material of the present invention are also useful for immersion lithography employing organic liquid as immersion medium.
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公开(公告)号：DE112014004266T5
公开(公告)日：2016-06-23
申请号：DE112014004266
申请日：2014-08-01
Applicant: IBM
Inventor： ALLEN ROBERT DAVID , BAJJURI KRISHNA MOHAN , BREYTA GREGORY , HEDRICK JAMES LUPTON , LARSON CARL ERIC
Abstract: Vorgesehen wird ein Verfahren zur Depolymerisation von Polyester aus gebrauchten Produkten, wie Getränkeflaschen, zur Herstellung eines hochreinen Reaktionsprodukts. Für die Depolymerisationsreaktion werden die Polyester mit einem Alkohol mit 2 bis 5 Kohlenstoffen und einem Amin-Organokatalysator bei einer Temperatur von etwa 150 °C bis etwa 250 °C miteinander reagiert. In einer Anwendung ermöglicht die Verwendung eines Organokatalysators mit einem Siedepunkt, der wesentlich unter dem Siedepunkt des Alkohol-Reaktants liegt, das einfache Recycling des Amin-Organokatalysators. In einer anderen Anwendung ermöglicht die Durchführung der Depolymerisationsreaktion unter Druck bei einer Temperatur über der des Alkohols beschleunigte Depolymerisationsraten und die Rückgewinnung des Organokatalysators ohne weitere Wärmezufuhr. In einer weiteren Anwendung erzeugt die glykolitische Depolymerisation von Poly(ethylenterephthalat)(PET) aus gebrauchten Getränkeflaschen ein reines Reaktionsprodukt von Bis(2-hydroxyethyl)terephthalat (BHET), was wiederum zur Herstellung eines hochreinen PET in Getränkeflaschenqualität verwendet werden kann, in einem Closed Loop-Prozess mit minimalem Ausstoß und Abfall.
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公开(公告)号：DE3860953D1
公开(公告)日：1990-12-13
申请号：DE3860953
申请日：1988-01-22
Applicant: IBM
Inventor： HACKER NIGEL PATRICK , LARSON CARL ERIC
IPC: C08G59/18 , C07C67/00 , C07C325/00 , C07C381/12 , C08G59/00 , C08G59/68 , G03F7/029 , G03F7/031 , G03F7/027
Abstract: Alkyldiarylsulfonium salts of 9, 10,-dithiophenoxyanthracene as photoinitiators in resist compositions, such as epoxy resin formulations, particularly using long wavelength light.
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