公开(公告)号：US3729316A

公开(公告)日：1973-04-24

申请号：US3729316D

申请日：1970-02-17

Applicant: IBM

Inventor： PECORARO R ,  CASTRUCCI P ,  HADDAD N

IPC: H05K3/00 ,  G03F1/00 ,  H01L21/00 ,  H01L21/027 ,  G03C5/00

CPC classification number: G03F1/60 ,  H01L21/00

Abstract: A PROCESS FOR MAKING A PHOTOGRAPHIC OPTICAL GLASS MASK THAT IS USED IN SILICON INTEGRAED CIRCUIT WAFER PROCESSING. AN OPTICAL GLASS MASK IS MADE BY MEANS OF A STEP AND REPEAT CAMERA. DISPLACEMENT ERROR WHICH IS CAUSED BY THE DIFFERENCE IN CEFFICIENTS OF EXPANSION BETWEEN THE MICROSET SCALE OF THE STEP AND REPEAT CAMERA AND THE PHOTOGRAPHIC OPTICAL MASK, IS MINIMIZED BY USING THE SAME MATERIAL FOR BOTH ELEMENTS. FURTHER DISPLACEMENT ERROR CAUSED BY THERMAL MISMATCH OF THE OPTICAL GLASS MASK AND THE SILICON WAFER IS MINIMIZED BY USING A BOROSILICATE GLASS MASK HAVING A LINEAR COEFFICIENT OF EXPANSION OF 3.5X10-6/DEGREES C., WHICH SUBSTANTIALLY MATCHES HE LINEAR COEFFICIENT OF EXPANSION OF THE SILICON WAFER MATERIAL.

Abstract translation: 1323647 Photo-masks国际商业公司1971年4月19日[1970年2月17日] 21760/71标题G2M制备半导体集成电路的光掩模包括布置在硼硅酸盐玻璃支撑构件上的电路图案。 主面罩可以通过步骤和重复照相机制成，并用于联系打印副主席，后者又用于联系打印工作台面具，2个主人和面具都有硼硅酸盐玻璃支架。