公开(公告)号：DE1769327A1

公开(公告)日：1972-03-02

申请号：DE1769327

申请日：1968-05-09

Applicant: IBM DEUTSCHLAND

Inventor： EBERT ECKEHARD ,  HEINEMANN ALFRED

IPC: C30B25/02 ,  H01L21/205 ,  B01J17/32

公开(公告)号：GB1235784A

公开(公告)日：1971-06-16

申请号：GB2276069

申请日：1969-05-05

Applicant: IBM

Inventor： EBERT ECKEHARD ,  HEINEMANN ALFRED

IPC: C30B25/02 ,  H01L21/205

Abstract: 1,235,784. Silicon. INTERNATIONAL BUSINESS MACHINES CORP. 5 May, 1969 [9 May, 1968], No. 22760/69. Heading C1A. [Also in Division C7] In the epitaxial deposition of silicon on a heated substrate by the pyrolytic decomposition of a gaseous vapour phase, the source of silicon is mono-iodo silane, SH 3 I. The gaseous or vapour phase may contain doping agents.