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    ELECTRON BEAM APPARATUS
    3.
    发明专利
    ELECTRON BEAM APPARATUS 未知

    公开(公告)号：DE3380504D1

    公开(公告)日：1989-10-05

    申请号：DE3380504

    申请日：1983-03-25

    Applicant: IBM

    Inventor： CHANG TAI-HON PHILIP ,  COANE PHILIP JAMES ,  HOHN FRITZ-JURGEN ,  KERN DIETER PAUL

    IPC: H01J37/06 ,  G01R31/02 ,  G01R31/302 ,  H01J37/04 ,  H01J37/28 ,  H01J37/30 ,  H01L21/66 ,  H05K3/00

    Abstract: he electron potential of an electron beam is switched between different values without moving the focal plane by effectively changing the axial position of the electron source at the same time that the electron potential is changed. The effective change in axial position of the electron source exactly compensates for the altered effectiveness which magnetic lenses have upon an electron beam of altered electron potential such that the final focal plane remains at the same position without adjusting the field strength of any magnetic lens.As shown in the figure a first and second electron beam sources (32, 34) generate electron beams (64,66), which are focused by coil-lenses (48, 50) and deflected by plates (52, 54). Between sources (32, 34) and the electron optical column (20) is beam selector (56). The selector (56) comprises deflection plates (58) and shield (60). When plates (58) are at potential V1 one beam passes through shield (60) and when plates (58) are at potential V2 the other beam passes through the shield. The two beams (64, 66) have different energies.

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