公开(公告)号：JP2002062532A

公开(公告)日：2002-02-28

申请号：JP2001192436

申请日：2001-06-26

Applicant: IBM

Inventor： CALLEGARI ALESSANDRO ,  PURAVIIN CHOODARI ,  JAMES PATRICK DOYLE ,  GALLIGAN EILEEN ANN ,  KATO YOSHIMINE ,  JAMES ANDREW LACEY ,  SHUI CHIN ALAN RYAN ,  MINHA RUU ,  NAKANO HIROTAKE

IPC: G02F1/1333 ,  C23C14/06 ,  C23C14/22 ,  C23C14/34 ,  G02F1/1337

Abstract: PROBLEM TO BE SOLVED: To provide a method for forming an alignment layer on a substrate. SOLUTION: The film is adhered and aligned in a single step with a method containing a step to shoot an ion-beam at the substrate with a specified incident angle and simultaneously to adhere the film to the substrate (a) and to align an atomic structure of the film in at least a specified aligning direction (b).