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公开(公告)号:JPH0744853A
公开(公告)日:1995-02-14
申请号:JP11160894
申请日:1994-05-25
Applicant: IBM
Inventor: RICHIYAADO HENRII AARAATO , JIEIMUZU KENTO HAWAADO , TOTSUDO RANIA HAIRUTON , MAIKERU ANDORIYUU PAAKAA , MUHAMADO INAIETO URAA
Abstract: PURPOSE: To obtain a barium ferrite thin film having high magnetic characteristics, corrosion resistance and durability and intrinsic texture. CONSTITUTION: The thin film 60 has a front surface 65 and a base 67 forming a boundary with a substrate 70, is parallel with this substrate and is deposited by evaporation by reactive magnetron sputtering of a barium ferrite target in a coaxial sputtering system for orienting the sputtering target so as to face the substrate. This constitution exhibits the vapor deposition rate higher than the vapor deposition rate by the sputtering system to position the substrate perpendicular to the target on the circumference of the plasma without being limited by the powerful magnetic orientation perpendicular to the plane of the thin film.
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公开(公告)号:JPH04276314A
公开(公告)日:1992-10-01
申请号:JP28389291
申请日:1991-10-04
Applicant: IBM
Abstract: PURPOSE: To provide a production process for a thin-film cobalt alloy disk capable of selectively changing coercive force. CONSTITUTION: The prescribed amt. of gaseous hydrocarbon, such as methane, is introduced into an argon-base sputtering atmosphere in the production process for the vapor deposition, by sputtering, of the thin-film cobalt alloy magnetic recording disk. A direct relation exists between the amt. of the gaseous hydrocarbon in a sputtering chamber and the coercive force of the resulted disk and, therefore, the coercive force of the disk is selectively changeable by changing the amt. of the gaseous hydrocarbon. The process does not require the changing of the compsn. of a cobalt allay sputtering target and the thickness of the lower layer between a disk substrate and a magnetic layer and does not affect the SN ratio of read back signals.
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