公开(公告)号：JPH0744853A

公开(公告)日：1995-02-14

申请号：JP11160894

申请日：1994-05-25

Applicant: IBM

Inventor： RICHIYAADO HENRII AARAATO ,  JIEIMUZU KENTO HAWAADO ,  TOTSUDO RANIA HAIRUTON ,  MAIKERU ANDORIYUU PAAKAA ,  MUHAMADO INAIETO URAA

IPC: C23C14/08 ,  C23C14/58 ,  G11B5/64 ,  G11B5/65 ,  G11B5/66 ,  G11B5/85 ,  G11B5/851

Abstract: PURPOSE: To obtain a barium ferrite thin film having high magnetic characteristics, corrosion resistance and durability and intrinsic texture. CONSTITUTION: The thin film 60 has a front surface 65 and a base 67 forming a boundary with a substrate 70, is parallel with this substrate and is deposited by evaporation by reactive magnetron sputtering of a barium ferrite target in a coaxial sputtering system for orienting the sputtering target so as to face the substrate. This constitution exhibits the vapor deposition rate higher than the vapor deposition rate by the sputtering system to position the substrate perpendicular to the target on the circumference of the plasma without being limited by the powerful magnetic orientation perpendicular to the plane of the thin film.

公开(公告)号：JPS62257616A

公开(公告)日：1987-11-10

申请号：JP4694587

申请日：1987-03-03

Applicant: IBM

Inventor： RICHIYAADO HENRII AARAATO ,  JIEEMUZU KENTO HAWAADO ,  GUREESU SUU RIMU

IPC: G11B5/66 ,  G11B5/64 ,  G11B5/65 ,  G11B5/706 ,  G11B5/73 ,  G11B5/738

公开(公告)号：JPH04276314A

公开(公告)日：1992-10-01

申请号：JP28389291

申请日：1991-10-04

Applicant: IBM

Inventor： RICHIYAADO HENRII AARAATO ,  JIEIMUZU KENTO HAWAADO ,  SUTEIIBUN YUUJIN RANBAATO

IPC: G11B5/85 ,  C23C14/00 ,  C23C14/06 ,  C23C14/14 ,  C23C14/34 ,  G11B5/851

Abstract: PURPOSE: To provide a production process for a thin-film cobalt alloy disk capable of selectively changing coercive force. CONSTITUTION: The prescribed amt. of gaseous hydrocarbon, such as methane, is introduced into an argon-base sputtering atmosphere in the production process for the vapor deposition, by sputtering, of the thin-film cobalt alloy magnetic recording disk. A direct relation exists between the amt. of the gaseous hydrocarbon in a sputtering chamber and the coercive force of the resulted disk and, therefore, the coercive force of the disk is selectively changeable by changing the amt. of the gaseous hydrocarbon. The process does not require the changing of the compsn. of a cobalt allay sputtering target and the thickness of the lower layer between a disk substrate and a magnetic layer and does not affect the SN ratio of read back signals.

公开(公告)号：JPS62257617A

公开(公告)日：1987-11-10

申请号：JP4694687

申请日：1987-03-03

Applicant: IBM

Inventor： RICHIYAADO HENRII AARAATO ,  JIEEMUZU KENTO HAWAADO ,  GUREESU SUU RIMU

IPC: G11B5/66 ,  G11B5/64 ,  G11B5/73 ,  G11B5/738 ,  G11B5/82

Abstract: A magnetic recording medium is formed by depositing a layer of a cobalt-platinum magnetic alloy (which may also contain chromium) on a non-magnetic underlayer consisting of tungsten, molybdenum, niobium or vanadium. The magnetic alloy has a higher coercivity than when deposited on a chromium underlayer. The coercivity of the magnetic alloy becomes even higher when the substrate is maintained within such a temperature range during deposition of the magnetic alloy that an intermetallic compound of cobalt and the metal of the underlayer is formed at the interface between the magnetic alloy layer and the underlayer.