公开(公告)号：DE3175044D1

公开(公告)日：1986-09-04

申请号：DE3175044

申请日：1981-10-30

Applicant: IBM DEUTSCHLAND ,  IBM

Inventor： ASCH KARL ,  GRESCHNER JOHANN DR ,  KALLMEYER MICHAEL ,  KULCKE WERNER DR

IPC: G01R1/06 ,  G01R1/073

Abstract: A probe head arrangement for contacting a plurality of closely adjacent conductor lines 2 comprises a minimum of one probe head 3, where a plurality of fingers 4 together with a back 5 are made in one piece of monocrystalline silicon in semiconductor technique. A plurality of such probe heads 3 are composed to form a tester. At the beginning of each test it is determined which fingers 4 are to be, and are not to be placed onto the individual conductor lines 2 of a card 1 to be tested. Subsequently, the short and interruption tests can be implemented after the correlation of finger and probe head addresses with the conductor line addresses.

公开(公告)号：FR2313801A1

公开(公告)日：1976-12-31

申请号：FR7610901

申请日：1976-04-08

Applicant: IBM

Inventor： KALLMEYER MICHAEL ,  SOLF BERNHARD

IPC: H02P3/08 ,  G05D3/20 ,  H02P7/06

公开(公告)号：DE69026117T2

公开(公告)日：1996-10-02

申请号：DE69026117

申请日：1990-10-18

Applicant: IBM

Inventor： BOOKE MICHAEL ,  KALLMEYER MICHAEL ,  RIZK NABIL ,  YAU YOU-WEN

IPC: H01J37/302 ,  H01J37/31 ,  H05K3/00 ,  G05B19/402

Abstract: A high precision system for machining substrates by means of an energy beam includes real time digital signal processor control and a deflection system providing control, within a predetermined field of the substrate, of the angle at which the beam machines the substrate. An electron beam is used in a vacuum chamber in a preferred embodiment. The system also includes an x-y table for positioning the substrate and may have provision for detecting the x-y position and angular misregistration of the substrate. Dynamic forms and stigmator control may be used to produce a uniform beam within the field. The system allows a high speed vector machining process, which optimizes the overall system throughput by minimizing the settling time of the deflection system.

公开(公告)号：DE69026117D1

公开(公告)日：1996-04-25

申请号：DE69026117

申请日：1990-10-18

Applicant: IBM

Inventor： BOOKE MICHAEL ,  KALLMEYER MICHAEL ,  RIZK NABIL ,  YAU YOU-WEN

IPC: H01J37/302 ,  H01J37/31 ,  H05K3/00 ,  G05B19/402

Abstract: A high precision system for machining substrates by means of an energy beam includes real time digital signal processor control and a deflection system providing control, within a predetermined field of the substrate, of the angle at which the beam machines the substrate. An electron beam is used in a vacuum chamber in a preferred embodiment. The system also includes an x-y table for positioning the substrate and may have provision for detecting the x-y position and angular misregistration of the substrate. Dynamic forms and stigmator control may be used to produce a uniform beam within the field. The system allows a high speed vector machining process, which optimizes the overall system throughput by minimizing the settling time of the deflection system.

公开(公告)号：DE2264030A1

公开(公告)日：1974-07-18

申请号：DE2264030

申请日：1972-12-29

Applicant: IBM DEUTSCHLAND

Inventor： KORTH HANS ERDMANN DIPL PHYS ,  FROSCH ALBERT DIPL PHYS ,  SOLF BERNHARD DIPL ING ,  KALLMEYER MICHAEL

IPC: G01B11/30 ,  G01B11/24