公开(公告)号：DE2960900D1

公开(公告)日：1981-12-10

申请号：DE2960900

申请日：1979-09-28

Applicant: IBM

Inventor： GIEDD GARY ROBERT ,  KARSCH ARTHUR FREDERICK ,  LINDAUER SIDNEY L

IPC: G01D9/30 ,  G01D9/08 ,  G01D9/28 ,  G01D15/10 ,  G01D15/28

公开(公告)号：DE2350275A1

公开(公告)日：1974-05-30

申请号：DE2350275

申请日：1973-10-06

Applicant: IBM

Inventor： DIFAZIO JAMES JOSEPH ,  GUIFFRE GEORGE JOSEPH ,  KARSCH ARTHUR FREDERICK

IPC: H01L21/027 ,  G03F1/54 ,  G03F7/004 ,  G03F1/00

Abstract: 1397481 Photo-mask INTERNATIONAL BUSINESS MACHINES CORP 19 Sept 1973 [17 Nov 1972] 43957/73 Heading G2X An exposure mask is formed by (1) selectively exposing a light-sensitive layer (e.g. a diazo layer) on a substrate to form an image which is visible in non-actinic light, (2) visually locating defects (e.g. spots or holes) in the image with non-actinic light, (3) correcting the defects by the local application of light-sensitive material to, and/or the local exposure of light-sensitive material on, the substrate, and (4) developing to form a permanent image.

公开(公告)号：DE2225665A1

公开(公告)日：1973-01-11

申请号：DE2225665

申请日：1972-05-26

Applicant: IBM

Inventor： DRUSCHEL WILLIAM OTTO ,  KARSCH ARTHUR FREDERICK ,  SCHNEIDER JUN WILLIAM CLARK

IPC: G03F1/72 ,  H01L21/00 ,  H05K3/00