公开(公告)号：JPH04328747A

公开(公告)日：1992-11-17

申请号：JP33464691

申请日：1991-12-18

Applicant: IBM

Inventor： KASURIIN MARII KOONETSUTO ,  JIYOOJI JIYOZEFU HEFUERON ,  MERUBIN UOREN MONTOGOMERII ,  UEIN MAATEIN MOROO

IPC: G03F7/004 ,  G03F7/022 ,  G03F7/16 ,  H01L21/027

Abstract: PURPOSE: To more uniformly coat the top of a substrate having a uniform of ununiform pattern by preparing a specified radiation sensitive compsn. and spin-coating the top of a semiconductive wafer with the compsn. CONSTITUTION: This radiation sensitive compsn. is composed of at least one of novolak resin and a polyvinylphenol copolymer, a radiation sensitive component selected from among diazoquinone, polyolefin sulfone and an acid generating agent and an ethyl-3-ethoxypropionate(EEP) solvent. The top of a substrate is spin-coated with the compsn. and the resultant film is dried until the solvent content of the film is reduced to