公开(公告)号：WO2007039374A3

公开(公告)日：2007-07-05

申请号：PCT/EP2006065995

申请日：2006-09-05

Applicant: IBM ,  IBM UK ,  HOLMES STEVEN ,  FURUKAWA TOSHIHARU ,  KOBURGER CHARLES III ,  MOUMEN NAIM

Inventor： HOLMES STEVEN ,  FURUKAWA TOSHIHARU ,  KOBURGER CHARLES III ,  MOUMEN NAIM

IPC: G03F7/20 ,  G03F7/11

CPC classification number: G03F7/2041 ,  G03F7/11 ,  G03F7/70341 ,  G03F7/70958

Abstract: An immersion lithography system is provided which includes an optical source operable to produce light having a nominal wavelength and an optical imaging system. The optical imaging system has an optical element in an optical path from the optical source to an article to be patterned thereby. The optical element has a face which is adapted to contact a liquid occupying a space between the face and the article. The optical element includes a material which is degradable by the liquid and a protective coating which covers the degradable material at the face for protecting the face from the liquid, the protective coating being transparent to the light, stable when exposed to the light and stable when exposed to the liquid.

Abstract translation: 提供浸没式光刻系统，其包括可操作以产生具有标称波长的光的光源和光学成像系统。 光学成像系统在从光源到要被图案化的物品的光路中具有光学元件。 光学元件具有适于接触占据面部和物品之间的空间的液体的面。 光学元件包括可通过液体降解的材料和覆盖可降解材料的表面以保护表面免受液体影响的保护涂层，保护涂层对光线是透明的，当暴露于光时稳定并且稳定时 暴露于液体。

公开(公告)号：WO2007039374B1

公开(公告)日：2007-08-30

申请号：PCT/EP2006065995

申请日：2006-09-05

Applicant: IBM ,  IBM UK ,  HOLMES STEVEN ,  FURUKAWA TOSHIHARU ,  KOBURGER CHARLES III ,  MOUMEN NAIM

Inventor： HOLMES STEVEN ,  FURUKAWA TOSHIHARU ,  KOBURGER CHARLES III ,  MOUMEN NAIM

IPC: G03F7/20 ,  G03F7/11

CPC classification number: G03F7/2041 ,  G03F7/11 ,  G03F7/70341 ,  G03F7/70958

Abstract: An immersion lithography system is provided which includes an optical source operable to produce light having a nominal wavelength and an optical imaging system. The optical imaging system has an optical element in an optical path from the optical source to an article to be patterned thereby. The optical element has a face which is adapted to contact a liquid occupying a space between the face and the article. The optical element includes a material which is degradable by the liquid and a protective coating which covers the degradable material at the face for protecting the face from the liquid, the protective coating being transparent to the light, stable when exposed to the light and stable when exposed to the liquid.

Abstract translation: 提供了一种浸没光刻系统，其包括可操作以产生具有标称波长的光和光学成像系统的光源。 光学成像系统具有从光源到待图案化的制品的光路中的光学元件。 光学元件具有适于接触占据面部和制品之间的空间的液体的面。 光学元件包括可被液体降解的材料和覆盖面上的可降解材料以保护面部免受液体的保护涂层，保护涂层对于光是透明的，当暴露于光时稳定，并且当稳定时 暴露于液体。

公开(公告)号：DE602006004074D1

公开(公告)日：2009-01-15

申请号：DE602006004074

申请日：2006-09-05

Applicant: IBM

Inventor： KOBURGER CHARLES III ,  HOLMES STEVEN ,  HORAK DAVID ,  KIMMEL KURT ,  PETRILLO KAREN ,  ROBINSON CHRISTOPHER

IPC: G03F7/20

Abstract: An article including a microelectronic substrate is provided as an article usable during the processing of the microelectronic substrate. Such article includes a microelectronic substrate having a front surface, a rear surface opposite the front surface and a peripheral edge at boundaries of the front and rear surfaces. The front surface is a major surface of the article. A removable annular edge extension element having a front surface, a rear surface and an inner edge extending between the front and rear surfaces has the inner edge joined to the peripheral edge of the microelectronic substrate. In such way, a continuous surface is formed which includes the front surface of the edge extension element extending laterally from the peripheral edge of the microelectronic substrate and the front surface of the microelectronic substrate, the continuous surface being substantially co-planar and flat where the peripheral edge is joined to the inner edge.