公开(公告)号：DE3268937D1

公开(公告)日：1986-03-20

申请号：DE3268937

申请日：1982-06-15

Applicant: IBM

Inventor： ELDRIDGE JEROME MICHAEL ,  LEE MICHAEL HEIWO ,  SCHWARTZ GERALDINE COGIN

IPC: C23F4/00 ,  C23C8/10 ,  C23F1/00 ,  C23F1/20 ,  H01L21/302 ,  H01L21/316 ,  C23C8/00 ,  C23F17/00 ,  C23C14/00

Abstract: Aluminium-based alloy films and metallization layers that are patterned by reactive ion etching (RIE) are passivated by etching surface portions of the films or layers with a phosphoric-chromic mixture to remove contaminants and then oxidizing the exposed surface portions in an oxygen atmosphere.