公开(公告)号：US3669669A

公开(公告)日：1972-06-13

申请号：US3669669D

申请日：1970-10-28

Applicant: IBM

Inventor： KLEIN DONALD L ,  MACINTYRE MICHAEL W ,  ROTHMAN LAWRENCE J

IPC: C08K5/28 ,  G03F7/012 ,  H01L21/312 ,  G03C1/52

CPC classification number: H01L21/312 ,  C08K5/28 ,  G03F7/0125 ,  C08L15/00

Abstract: A CYCLIZED POLYISOPRENE/ARYL BIS-AZIDE SENSITIZED NEGATIVE PHOTORESIST FOR SEMICONDUCTOR DEVICE MANUFACTURE CONTAINING A MAXIMUM OF 1.3% SENSITIZER, AND CHARACTERIZED BY THE THREE PARAMETERS

(A) THE PERCENTAGE OF UNCYCLIZED ISOPRENE (FOR MONOMER) UNITS AS A FUNCTION OF SENSITIZER CONTENT, REPRESENTED BY THE SYMBOL R, WHERE R=PERCENT UNCYCLIZED POLYISOPRENE/PERCENT SENSITIZER. (B) THE RATIO OF INTERNAL TO TERMINAL DOUBLE BONDS IN A CYCLIZED MATERIAL AS A FUNCTION OF SENSITIZER REPRESENTED BY THE SYMBOL Q, WHERE Q=IR ABSORBANCE OF INTERNAL C=C/IR ABSORBANCE TERMINAL C=C-PERCENT SENSISITIZER, AND (C) A COMBINED SENSITIZER DEPENDENT FIGURE OF MERIT FUNCTION K WHERE K=QRS WITH THE FOLLOWING MAXIMUM LIMITS SET TO THE PARAMETERS:

QMAX=0.47, RMAX=13.0, AND KMAX=7.94