公开(公告)号：US3669669A

公开(公告)日：1972-06-13

申请号：US3669669D

申请日：1970-10-28

Applicant: IBM

Inventor： KLEIN DONALD L ,  MACINTYRE MICHAEL W ,  ROTHMAN LAWRENCE J

IPC: C08K5/28 ,  G03F7/012 ,  H01L21/312 ,  G03C1/52

CPC classification number: H01L21/312 ,  C08K5/28 ,  G03F7/0125 ,  C08L15/00

Abstract: A CYCLIZED POLYISOPRENE/ARYL BIS-AZIDE SENSITIZED NEGATIVE PHOTORESIST FOR SEMICONDUCTOR DEVICE MANUFACTURE CONTAINING A MAXIMUM OF 1.3% SENSITIZER, AND CHARACTERIZED BY THE THREE PARAMETERS

(A) THE PERCENTAGE OF UNCYCLIZED ISOPRENE (FOR MONOMER) UNITS AS A FUNCTION OF SENSITIZER CONTENT, REPRESENTED BY THE SYMBOL R, WHERE R=PERCENT UNCYCLIZED POLYISOPRENE/PERCENT SENSITIZER. (B) THE RATIO OF INTERNAL TO TERMINAL DOUBLE BONDS IN A CYCLIZED MATERIAL AS A FUNCTION OF SENSITIZER REPRESENTED BY THE SYMBOL Q, WHERE Q=IR ABSORBANCE OF INTERNAL C=C/IR ABSORBANCE TERMINAL C=C-PERCENT SENSISITIZER, AND (C) A COMBINED SENSITIZER DEPENDENT FIGURE OF MERIT FUNCTION K WHERE K=QRS WITH THE FOLLOWING MAXIMUM LIMITS SET TO THE PARAMETERS:

QMAX=0.47, RMAX=13.0, AND KMAX=7.94

公开(公告)号：FR2356447A1

公开(公告)日：1978-01-27

申请号：FR7714016

申请日：1977-05-03

Applicant: IBM

Inventor： DOUGHERTY WILLIAM E JR ,  GREGOR LAWRENCE V ,  KLEIN DONALD L ,  REDMOND THOMAS F ,  REEBER MORTON D

IPC: F25D9/00 ,  G12B15/02 ,  H01L23/427 ,  H05K7/20 ,  H01L23/44 ,  B01D43/00

Abstract: A device for removing contaminant impurities, particularly contaminants existing at very low levels, from a liquid, including a heating element at least partially immersible in the liquid, a confinement means at least partially immersible in the liquid for maintaining a pulsating bubble of vapor of the liquid, the heating element located within the confining means, openings in the confining means to allow periodic partial escape of the vapor bubble and ingress of liquid.