-
公开(公告)号：US3612698A
公开(公告)日：1971-10-12
申请号：US3612698D
申请日：1969-05-01
Applicant: IBM
Inventor： MATHISEN EINAR S
CPC classification number: G03F9/70 , G02B27/46 , Y10S359/90
Abstract: System and method for automatic alignment of workpieces such as semiconductor wafers and a photomask for subsequent image exposure. Alignment is based on the transparency of the wafers to infrared light and the opaqueness thereto of alignment patterns fabricated in the wafer. A holographic optical system generates a Fourier transformed image of light transmitted through the wafer and cross-correlates the transformed image with a complex spatial filter to generate recognition spots of light having spot displacements corresponding to the waferfilter nonalignment. The spot displacements generate an error signal used to control the wafer position.
-
公开(公告)号：US3588217A
公开(公告)日：1971-06-28
申请号：US3588217D
申请日：1969-06-17
Applicant: IBM
Inventor： MATHISEN EINAR S
CPC classification number: G03H1/32
Abstract: IN AN APPARATUS FOR DISPLAYING THE IMAGE OF A HOLOGRAM, A FIBER OPTIC DEVICE IS LOCATED TO FORM PART OF THE PATH OF THE COHERENT LIGHT ILLUMINATING THE HOLOGRAM AND IS MOVED AT ITS MIDSECTION WHILE THE ENDS ARE HELD RIGID AS THE HOLOGRAM IS VIEWED. THIS OPERATION OF THE APPARATUS CHANGES THE INTERFERENCE PATTERNS THAT ARE ATTRIBUTABLE TO THE LIGHT SOURCE AND NOT THE HOLOGRAM AND THEREBY REDUCES SPECKLE NOISE THAT OTHERWISE OCCURS IN THE HOLOGRAM.
-
公开(公告)号：US3597045A
公开(公告)日：1971-08-03
申请号：US3597045D
申请日：1969-06-30
Applicant: IBM
Inventor： MATHISEN EINAR S
CPC classification number: G02B27/46 , H01L2223/54493
Abstract: A method and system for the identification of semiconductor wafers. A code in the form of selected recognition symbols is inscribed in circuit-free regions or kerf areas of the wafer. In a separate operation, complex spatial filters of the entire set of recognition symbols are formed in spaced locations on a photographic medium. To detect whether a particular symbol has been inscribed in the wafer, the symbols within the wafer are cross-correlated with the complex spatial filters on the medium. The matching of a symbol with the complex spatial filter of that symbol produces a recognition spot of light behind the filter. A photodetector associated with each filter detects the light output when a match occurs.
-
4.发明授权Contactless mask pattern exposure process and apparatus system having virtual extended depth of focus 失效无接触掩模图案曝光过程和装置虚拟扩展深度聚焦
公开(公告)号：US3677634A
公开(公告)日：1972-07-18
申请号：US3677634D
申请日：1968-12-23
Applicant: IBM
Inventor： MATHISEN EINAR S
CPC classification number: G03H1/00 , G03F7/70408 , H01L21/00 , H05K3/0082 , Y10S359/90
Abstract: Forming a photoresist mask pattern by employing a threedimensional mask having non-reflective passages. The mask pattern is recorded on a holographic plate to form a holographic pattern. Thereafter, the holographic pattern is spatially reconstructed so as to form a reconstructed radiation mask pattern having a virtual extended depth of focus defined by the mask entrance and exit images which is used to expose a photo-sensitized surface.
Abstract translation: 通过采用具有非反射通道的三维掩模形成光致抗蚀剂掩模图案。 将掩模图案记录在全息板上以形成全息图案。 此后，全息图案被空间重建，以便形成具有由掩模入口限定的虚拟扩展深度和用于曝光感光表面的出射图像的重建辐射掩模图案。
-
公开(公告)号：US3614232A
公开(公告)日：1971-10-19
申请号：US3614232D
申请日：1968-11-25
Applicant: IBM
Inventor： MATHISEN EINAR S
IPC: G01N21/956 , G02B27/46 , G01N21/32
CPC classification number: G02B27/46 , G01N21/95623
Abstract: Defects in microcircuit patterns are sensed by illuminating the pattern with monochromatic collimated light. The illuminated pattern is imaged through a lens to produce substantially a twodimensional optical Fourier transform of the pattern at a plane on the output side of the lens. An optical filter (transparency) which includes substantially the negative of the Fourier transform of a defect-free specimen of the microcircuit is placed at the aforesaid plane to block the optical frequency components corresponding to the defect-free specimen. Light passing through the filter is processed to provide various indications of the pattern defects.
-
Patent Agency Ranking
公开(公告)号：US3604777A
公开(公告)日：1971-09-14
申请号：US3604777D
申请日：1969-10-21
Applicant: IBM
Inventor： MATHISEN EINAR S , SHEINER LEONARD S
CPC classification number: G03H1/0402 , G03H1/2286 , G03H2001/0094 , G03H2001/0413 , G03H2001/226 , G03H2001/2278 , G03H2210/20 , G03H2222/52 , G03H2222/53 , G03H2222/54 , G03H2222/56 , G03H2223/14 , G03H2223/24 , G03H2223/25
Abstract: Method and apparatus for constructing and reconstructing a hologram, whereby the hologram is reconstructed upon the original image plane used in constructing the hologram, by use, in one embodiment, of a spherical mirror placed to reflect divergent light originally passing through the hologram, back through the hologram as convergent light. Included are liquid gate means for reducing reflection glare from the hologram onto the reconstructed image.
-
7.发明授权
公开(公告)号：US3582176A
公开(公告)日：1971-06-01
申请号：US3582176D
申请日：1968-12-26
Applicant: IBM
Inventor： MATHISEN EINAR S
CPC classification number: G03H1/00 , G03H1/2249 , G03H2001/0094 , G03H2210/30
Abstract: Optical apparatus is disclosed for simultaneously illuminating every accessible (i.e., exposed-to-view) surface of a threedimensional object with monochromatic spatially coherent light. The light reflected from the object is collected and directed on a photosensitive film which also receives a reference beam of monochromatic spatially coherent light of the same frequency as the illuminating beam. The photographic hologram resulting from the development of the film is illuminated by a beam which is the conjugate of said reference beam to produce a real image of the original object. A suitably photosensitized duplicate object, placed at the position of the original object is exposed to the real image whereby every corresponding accessible surface of the duplicate object simultaneously is exposed to the real image.
-
公开(公告)号：CA1058904A
公开(公告)日：1979-07-24
申请号：CA263202
申请日：1976-10-08
Applicant: IBM
Inventor： DEMSKY HERBERT M , MATHISEN EINAR S , SCHUMANN PAUL A JR , TONG ALVIN H
Abstract: APPARATUS FOR TEXTILE COLOR ANALYSIS USING REFLECTED LIGHT In a textile color analyzer, a sample of textile is supported on the pad of an elevator mechanism that holds the sample against an instrument head. The head has an opaque housing provided with a chamber having an opening therein. A glass plate is mounted in the head and covers the opening and presses against the textile sample to provide a stable reference plane. The head includes an illuminating fiber optic bundle that directs light substantially perpendicular to the textile sample. A plurality of additional fiber optic bundles are mounted to receive diffuse light reflected from the sample. The elevator includes a pad of translucent polyethelene material that backs up the textile sample and takes on the color of the sample so that there are no adverse effects due to light showing through the sample and reflecting from the plate.
-
公开(公告)号：CA1066085A
公开(公告)日：1979-11-13
申请号：CA263200
申请日：1976-10-08
Applicant: IBM
Inventor： DEMSKY HERBERT M , MATHISEN EINAR S , MILLEVOY ROBERT C , SCHUMANN PAUL A JR , TONG ALVIN H
Abstract: APPARATUS FOR TEXTILE COLOR ANALYSIS USING REFLECTED LIGHT In a textile color analyzer, a sample of textile is supported on the pad of an elevator mechanism that holds the sample against an instrument head. The head has an opaque housing provided with a chamber having an opening therein. A glass plate is mounted in the head and covers the opening and presses against the textile sample to provide a stable reference plane. The head includes an illuminating fiber optic bundle that directs light substantially perpendicular to the textile sample. A plurality of additional fiber optic bundles are mounted to receive diffuse light reflected from the sample. The elevator includes a pad of translucent polyethelene material that backs up the textile sample and takes on the color of the sample so that there are no adverse effects due to light showing through the sample and reflecting from the plate.
-
公开(公告)号：FR2315717A1
公开(公告)日：1977-01-21
申请号：FR7615003
申请日：1976-05-13
Applicant: IBM
Inventor： ERICKSON JOHN J , LELAND HAROLD L , MATHISEN EINAR S
-
-
-
-
-
-
-
-
-
Search Results
21
records
(took 0.018 seconds)
