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公开(公告)号：US3786660A
公开(公告)日：1974-01-22
申请号：US3786660D
申请日：1972-11-24
Applicant: IBM
Inventor： APPENZELLER H , MILLER J , SHEA V
IPC: B23Q3/08 , B21D43/00 , H01L21/02 , H01L21/027 , H01L21/304 , H01L21/673 , B21D26/00
CPC classification number: B21D43/003
Abstract: A wafer transport apparatus to lock and hold a wafer in a predetermined contoured position while permitting transport of the wafer from the contouring apparatus to a remote location for further processing on the contoured wafer surface. The apparatus comprises a pallet having a plurality of pedestals therein, and vacuum cups at one extended end of the pedestals for supporting and gripping a wafer thereon. Means are provided to permit reciprocation of individual ones of the pedestals in the pallet, when the pallet is positioned in the contouring apparatus, and pedestal locks are provided to grasp and lock individual ones of the pedestals in an individually determinable position, while holding the pedestals in that position so that the pallet may be removed from the apparatus and positioned at some remote station. The purpose of this abstract is to enable the public and the Patent Office to determine rapidly the subject matter of the technical disclosure of the application. This abstract is neither intended to define the invention of the application nor is it intended to be limiting as to the scope thereof.
Abstract translation: 一种晶片传送装置，用于将晶片锁定并保持在预定的轮廓位置，同时允许晶片从轮廓设备传送到远程位置，以便在轮廓的晶片表面上进一步处理。 该装置包括其中具有多个基座的托盘和在基座的一个延伸端处的真空杯，用于支撑和夹持其上的晶片。 当托盘定位在轮廓设备中时，提供了用于允许托架中的单个基座往复运动的装置，并且提供基座锁以在单独确定的位置中抓住并锁定各个基座，同时保持基座 在该位置，使得托盘可以从设备移除并且定位在一些远程站。
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公开(公告)号：US3853313A
公开(公告)日：1974-12-10
申请号：US39829273
申请日：1973-09-17
Applicant: IBM
Inventor： APPENZELLER H , MILLER J , SHEA V
IPC: B21D43/00 , H01L21/673 , B25B11/00
CPC classification number: B21D43/003
Abstract: A wafer transport apparatus to lock and hold a wafer in a predetermined contoured position while permitting transport of the wafer from the contouring apparatus to a remote location for further processing on the contoured wafer surface. The apparatus comprises a pallet having a plurality of pedestals therein, and vacuum cups at one extended end of the pedestals for supporting and gripping a wafer thereon. Means are provided to permit reciprocation of individual ones of the pedestals in the pallet, when the pallet is positioned in the contouring apparatus, and pedestal locks are provided to grasp and lock individual ones of the pedestals in an individually determinable position, while holding the pedestals in that position so that the pallet may be removed from the apparatus and positioned at some remote station.
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公开(公告)号：SE343680B
公开(公告)日：1972-03-13
申请号：SE724969
申请日：1969-05-22
Applicant: IBM
Abstract: 1,260,704. Screw-and-nut mechanisms. INTERNATIONAL BUSINESS MACHINES CORP. 23 April, 1969 [22 May, 1968], No. 20758/69. Heading F2Q. Coarse axial adjustment of a probe 1 may be effected by manual rotation of a knob member 8 when it is held in an axially extended position, shown in Fig. 2A, against the action of a spring 41, to cause disengagement of a clutch 7, 39, and fine adjustment may be effected by rotation of the knob member 8 with the clutch 7, 39 engaged. The knob member 8 carries drivepins 10 which engage axial slots 45 in a tubular member 4 which has a relatively coarse screwthreaded engagement with a support member 5. A sleeve 3 is slidably and rotatably mounted within the tubular member 4 and has a relatively fine screw-threaded engagement with the probe I. The sleeve 3 carries at one end a clutch part 39 and a closure cap 6 which is urged by a spring 42 into engagement with a thrust ball-bearing 12 carried by the tubular member 4. The probe 1 is prevented from rotating by a plunger 53 which engages a keyway 51 in the upper surface of probe 1. A pin 13 limits axial movement of the probe 1. When the clutch 7, 39 is engaged the screw threads act differentially. Two such probe mechanisms are used at right angles to accurately position a workpiece such as a semi-conductor wafer.
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