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公开(公告)号：US3711081A
公开(公告)日：1973-01-16
申请号：US3711081D
申请日：1970-03-31
Applicant: IBM
Inventor： CACHON R
CPC classification number: G03F7/70691 , H01L21/682
Abstract: This patent discloses apparatus for accurately aligning a semiconductor wafer to a photo mask, the apparatus disclosed comprising a base and a frame for the apparatus. The base portion includes a chamber in which is mounted a piston which is restrained from lateral movement while permitting vertical reciprocation thereof. In the upper portion of the piston is a socket which supports a gimbal, the gimbal including means for receiving a wafer thereon. Mounted on the frame is a carriage which includes means for positioning a mask in superimposed overlapping relation relative to the gimbal while clamping the mask to the frame. Also disclosed is fluid supply means which is connected to the socket so that the gimbal will float on a cushion, for example, of air. The piston is provided with elevating means to cause the piston to raise beyond the point of contact of a wafer mounted on the gimbal with the mask. Also disclosed is means responsive to the increase in fluid pressure which results from the contact of the wafer with the mask for stopping the elevating means and thus the piston. Thereafter the piston is lowered a preset and predetermined amount to thereby space the wafer from the mask permitting adjustment of the base relative to the frame. Also disclosed is a novel gimbal with a wafer alignment apparatus built in so as to automatically initially position the wafer in a desired predetermined position on the gimbal.
Abstract translation: 该专利公开了一种用于将半导体晶片精确地对准光掩模的装置，所述装置包括用于装置的基座和框架。 底座部分包括一个室，其中安装有活塞，该活塞在允许其垂直往复运动的同时被限制在横向运动中。 在活塞的上部是支撑万向节的插座，该万向架包括用于在其上接收晶片的装置。 安装在框架上的是一种托架，该托架包括用于将掩模相对于万向架以叠加的重叠关系定位的装置，同时将掩模夹在框架上。 还公开了流体供应装置，其连接到插座，使得万向架将浮在例如空气的衬垫上。 活塞设置有升降装置，以使活塞升高超过安装在万向架上的晶片与面罩的接触点。 还公开了响应于由于晶片与掩模的接触而产生的流体压力的增加的装置，用于停止升降装置并因此停止活塞。 此后，活塞降低预设和预定量，从而使晶片与掩模相隔离，允许基座相对于框架的调节。
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Patent Agency Ranking
公开(公告)号：US3769794A
公开(公告)日：1973-11-06
申请号：US3769794D
申请日：1970-03-31
Applicant: IBM
Inventor： CACHON R
CPC classification number: H05K13/0015 , B23Q1/58
Abstract: This patent discloses apparatus for effecting changes in the position of a workpiece, the apparatus comprising a transmitter or control unit which is coupled to a remotely positioned manipulator or receiver. Each of the transmitter and receiver includes a chamber, the chamber of the transmitter being connected to the chamber of the receiver by tubing and the like. In the chamber of the transmitter is means to effect large volumetric changes in the volume of the chamber and separate means to effect small changes in the volume of the chamber, in the disclosed illustration a pair of concentrically disposed pistons. In the chamber of the receiver is another piston which is coupled to output means such as a shaft so that, upon filling the chambers associated with the transmitter and receiver with a liquid, both large and small volumetric changes in the transmitter chamber effected by one or both of the pistons in the chamber causes a change in the volume in the receiver chamber, thereby causing displacement of the piston in the receiver and thus changing the position of the output of the shaft.
Abstract translation: 该专利公开了用于实现工件位置变化的装置，该装置包括耦合到远程定位的操纵器或接收器的发射器或控制单元。 发射器和接收器中的每一个包括腔室，发射器的腔室通过管道等连接到接收器的腔室。 在所述变送器的腔室中，在所述公开的图示中，一对同心设置的活塞在腔室的体积中产生大的体积变化的装置和用于实现室的体积的小的变化的分离装置。 在接收器的腔室中是另一个活塞，其连接到诸如轴的输出装置，使得在用液体填充与发射器和接收器相关联的腔室时，发射器室中的大的和小的体积变化由一个或 腔室中的两个活塞引起接收器室中的体积变化，从而导致活塞在接收器中的位移，从而改变轴的输出位置。
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公开(公告)号：US3729206A
公开(公告)日：1973-04-24
申请号：US3729206D
申请日：1971-10-21
Applicant: IBM
Inventor： CACHON R , PERLMANN A , SCHORR M
IPC: B25B11/00 , H01L21/683 , H01L7/00
CPC classification number: B25B11/005 , Y10T279/11
Abstract: Automatically operated vacuum chuck apparatus employs fluidic logic selectively to retain semiconductor wafers or parts of broken wafers during processing. The chuck has vacuum connectors communicating with ports in a retaining surface that holds the wafer or part of the wafer. Individual fluidic logic circuits are connected in parallel to respective ones of these connectors and ports and in common to vacuum and pressure supplies. On apparatus actuation, those ports covered by the wafer or part thereof are sensed and vacuum is applied only to these ports under the control of the individual fluidic logic circuits.
Abstract translation: 自动操作的真空吸盘装置在处理过程中选择性地使用流体逻辑来保持半导体晶片或破碎晶片的部分。 卡盘具有与保持晶片或晶片的一部分的保持表面中的端口连通的真空连接器。 单独的流体逻辑电路与这些连接器和端口中的相应的一个并联连接，并且与真空和压力源相同。 在设备致动时，感测由晶片或其一部分覆盖的那些端口，并且在单独的流体逻辑电路的控制下仅向这些端口施加真空。
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公开(公告)号：CA925401A
公开(公告)日：1973-05-01
申请号：CA106339
申请日：1971-02-26
Applicant: IBM
Inventor： CACHON R
Abstract: This patent discloses apparatus for effecting changes in the position of a workpiece, the apparatus comprising a transmitter or control unit which is coupled to a remotely positioned manipulator or receiver. Each of the transmitter and receiver includes a chamber, the chamber of the transmitter being connected to the chamber of the receiver by tubing and the like. In the chamber of the transmitter is means to effect large volumetric changes in the volume of the chamber and separate means to effect small changes in the volume of the chamber, in the disclosed illustration a pair of concentrically disposed pistons. In the chamber of the receiver is another piston which is coupled to output means such as a shaft so that, upon filling the chambers associated with the transmitter and receiver with a liquid, both large and small volumetric changes in the transmitter chamber effected by one or both of the pistons in the chamber causes a change in the volume in the receiver chamber, thereby causing displacement of the piston in the receiver and thus changing the position of the output of the shaft.
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公开(公告)号：SE343680B
公开(公告)日：1972-03-13
申请号：SE724969
申请日：1969-05-22
Applicant: IBM
Abstract: 1,260,704. Screw-and-nut mechanisms. INTERNATIONAL BUSINESS MACHINES CORP. 23 April, 1969 [22 May, 1968], No. 20758/69. Heading F2Q. Coarse axial adjustment of a probe 1 may be effected by manual rotation of a knob member 8 when it is held in an axially extended position, shown in Fig. 2A, against the action of a spring 41, to cause disengagement of a clutch 7, 39, and fine adjustment may be effected by rotation of the knob member 8 with the clutch 7, 39 engaged. The knob member 8 carries drivepins 10 which engage axial slots 45 in a tubular member 4 which has a relatively coarse screwthreaded engagement with a support member 5. A sleeve 3 is slidably and rotatably mounted within the tubular member 4 and has a relatively fine screw-threaded engagement with the probe I. The sleeve 3 carries at one end a clutch part 39 and a closure cap 6 which is urged by a spring 42 into engagement with a thrust ball-bearing 12 carried by the tubular member 4. The probe 1 is prevented from rotating by a plunger 53 which engages a keyway 51 in the upper surface of probe 1. A pin 13 limits axial movement of the probe 1. When the clutch 7, 39 is engaged the screw threads act differentially. Two such probe mechanisms are used at right angles to accurately position a workpiece such as a semi-conductor wafer.
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