公开(公告)号：CA2031594A1

公开(公告)日：1991-06-06

申请号：CA2031594

申请日：1990-12-05

Applicant: IBM

Inventor： BUCHWALTER STEPHEN L ,  GOLDBERG MARTIN J ,  IYENGAR REVATHI ,  MORRIS DANIEL P ,  O'TOOLE TERRENCE R ,  VIEHBECK ALFRED

IPC: G02F1/15 ,  C09K9/00 ,  C09K9/02 ,  G09F9/30 ,  G09G3/38 ,  H01B1/12 ,  C07D487/04 ,  C07D519/00 ,  C09B57/00 ,  G02F1/153

公开(公告)号：DE69025236T2

公开(公告)日：1996-10-24

申请号：DE69025236

申请日：1990-07-05

Applicant: IBM

Inventor： GOLDBERG MARTIN J ,  MORRIS DANIEL P ,  VIEHBECK ALFRED

IPC: C07D209/48 ,  C07B43/00 ,  C07B45/00 ,  C07D471/06 ,  C07D487/04 ,  C07D519/00 ,  C08G73/10 ,  C08G85/00 ,  C25B3/25 ,  H05K1/03 ,  H05K3/00 ,  H05K3/46 ,  C25B3/04

Abstract: Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and methods of fabrication thereof consisting of a thioether, an ester, an ether, a phosphate and a silylether. Electrons are supplied to the carbonyl group conjugated to an aromatic moiety to form a reduced material. The reduced material is contacted with an electrophile which attacks and chemically combines with the carbonyl group conjugated to an aromatic moiety. The parent material can be regenerated by hydrolysis of the derivative. A silyl derivative can be selectively formed on a polyimide material surface which can act as a barrier to an RIE etch of the polyimide material. After etch the polyimide material is regenerated from the silyl derivative.

公开(公告)号：BR9007090A

公开(公告)日：1992-01-28

申请号：BR9007090

申请日：1990-12-04

Applicant: IBM

Inventor： BUCHWALTER STEPHEN L ,  GOLDBERG MARTIN J ,  IVENGAR REVATHI ,  MORRIS DANIEL P ,  O'TOOLE TERRENCE R ,  VIEHBECK ALFRED

IPC: G02F1/15 ,  C09K9/00 ,  C09K9/02 ,  G09F9/30 ,  G09G3/38 ,  H01B1/12 ,  G02F1/23

公开(公告)号：DE69027374D1

公开(公告)日：1996-07-18

申请号：DE69027374

申请日：1990-07-05

Applicant: IBM

Inventor： GOLDBERG MARTIN J ,  MORRIS DANIEL P ,  VIEHBECK ALFRED

IPC: C25B3/25 ,  C08G73/10 ,  C08G85/00 ,  G03F7/038 ,  H05K1/03 ,  H05K3/18 ,  H05K3/38

Abstract: A process for the synthesis of derivatives of materials containing an imide group conjugated to an aromatic moiety to form an ester, a thioester, an amide, a ketone, and silylesters. Electrons are supplied to redox sites to form a reduced imide material. The reduced imide material is contacted with a nucleophile which opens the imide ring of the reduced imide and chemically combines with a carbonyl carbon atom of the open imide ring to form an imide derivative.

公开(公告)号：DE69025236D1

公开(公告)日：1996-03-21

申请号：DE69025236

申请日：1990-07-05

Applicant: IBM

Inventor： GOLDBERG MARTIN J ,  MORRIS DANIEL P ,  VIEHBECK ALFRED

IPC: C07D209/48 ,  C07B43/00 ,  C07B45/00 ,  C07D471/06 ,  C07D487/04 ,  C07D519/00 ,  C08G73/10 ,  C08G85/00 ,  C25B3/25 ,  H05K1/03 ,  H05K3/00 ,  H05K3/46 ,  C25B3/04

Abstract: Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and methods of fabrication thereof consisting of a thioether, an ester, an ether, a phosphate and a silylether. Electrons are supplied to the carbonyl group conjugated to an aromatic moiety to form a reduced material. The reduced material is contacted with an electrophile which attacks and chemically combines with the carbonyl group conjugated to an aromatic moiety. The parent material can be regenerated by hydrolysis of the derivative. A silyl derivative can be selectively formed on a polyimide material surface which can act as a barrier to an RIE etch of the polyimide material. After etch the polyimide material is regenerated from the silyl derivative.