-
公开(公告)号:CA2031594C
公开(公告)日:1998-04-28
申请号:CA2031594
申请日:1990-12-05
Applicant: IBM
Inventor: VIEHBECK ALFRED , IYENGAR REVATHI , O'TOOLE TERRENCE R , GOLDBERG MARTIN J , BUCHWALTER STEPHEN L
IPC: G02F1/15 , C09K9/00 , C09K9/02 , G09F9/30 , G09G3/38 , H01B1/12 , C07D487/04 , C07D519/00 , C09B57/00 , G02F1/153
Abstract: An electrochemical color change cell incorporating as a color changing agent intramolecular charge transfer salt or an intermolecular charge transfer salt. The intermolecular charge transfer salts and the intramolecular charge transfer salts have a plurality of oxidation states and a wide variation in color change. The intermolecular and intramolecular charge transfer salts preferably contain a violene moiety and a moiety having a carbonyl group conjugated to an aromatic moiety. The intramolecular charge transfer salts have a stable covalent radical-anion/radical-cation configuration. The intermolecular charge transfer salts have a stable ionic radical-anion/radical-cation configuration.
-
公开(公告)号:DE68916523T2
公开(公告)日:1995-02-02
申请号:DE68916523
申请日:1989-11-17
Applicant: IBM
-
公开(公告)号:CA2031594A1
公开(公告)日:1991-06-06
申请号:CA2031594
申请日:1990-12-05
Applicant: IBM
Inventor: BUCHWALTER STEPHEN L , GOLDBERG MARTIN J , IYENGAR REVATHI , MORRIS DANIEL P , O'TOOLE TERRENCE R , VIEHBECK ALFRED
IPC: G02F1/15 , C09K9/00 , C09K9/02 , G09F9/30 , G09G3/38 , H01B1/12 , C07D487/04 , C07D519/00 , C09B57/00 , G02F1/153
-
公开(公告)号:DE69118442T2
公开(公告)日:1996-10-10
申请号:DE69118442
申请日:1991-05-15
Applicant: IBM
Inventor: GOLDBERG MARTIN J , ITO HIROSHI , KOVAC CAROLINE A , PALMER MICHAEL J , POLLAK ROGER A , POORE PAIGE A
Abstract: A chemical solder is described that includes an organometallic which thermally degrades within a predetermined temperature range to a metal and volatile compounds. The solder also includes a polymeric matrix that decomposes within the same temperature range to volatile fractions, thereby leaving only the metal. A method for bonding first and second bodies is disclosed wherein a chemical solder, as above-described, is disposed between the first and second bodies and heat is applied to elevate the solder to the predetermined temperature range to thermally degrade the organometallic compound and to decompose the polymeric matrix. The remaining metal bonds the first and second bodies.
-
公开(公告)号:DE69027374D1
公开(公告)日:1996-07-18
申请号:DE69027374
申请日:1990-07-05
Applicant: IBM
Inventor: GOLDBERG MARTIN J , MORRIS DANIEL P , VIEHBECK ALFRED
Abstract: A process for the synthesis of derivatives of materials containing an imide group conjugated to an aromatic moiety to form an ester, a thioester, an amide, a ketone, and silylesters. Electrons are supplied to redox sites to form a reduced imide material. The reduced imide material is contacted with a nucleophile which opens the imide ring of the reduced imide and chemically combines with a carbonyl carbon atom of the open imide ring to form an imide derivative.
-
公开(公告)号:DE69025236D1
公开(公告)日:1996-03-21
申请号:DE69025236
申请日:1990-07-05
Applicant: IBM
Inventor: GOLDBERG MARTIN J , MORRIS DANIEL P , VIEHBECK ALFRED
IPC: C07D209/48 , C07B43/00 , C07B45/00 , C07D471/06 , C07D487/04 , C07D519/00 , C08G73/10 , C08G85/00 , C25B3/25 , H05K1/03 , H05K3/00 , H05K3/46 , C25B3/04
Abstract: Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and methods of fabrication thereof consisting of a thioether, an ester, an ether, a phosphate and a silylether. Electrons are supplied to the carbonyl group conjugated to an aromatic moiety to form a reduced material. The reduced material is contacted with an electrophile which attacks and chemically combines with the carbonyl group conjugated to an aromatic moiety. The parent material can be regenerated by hydrolysis of the derivative. A silyl derivative can be selectively formed on a polyimide material surface which can act as a barrier to an RIE etch of the polyimide material. After etch the polyimide material is regenerated from the silyl derivative.
-
公开(公告)号:CA1335340C
公开(公告)日:1995-04-25
申请号:CA605524
申请日:1989-07-13
Applicant: IBM
Inventor: VIEHBECK ALFRED , BUCHWALTER STEPHEN L , DONSON WILLIAM A , GLENNING JOHN J , GOLDBERG MARTIN J , GREBE KURT R , KOVAC CAROLINE A , MATTHEW LINDA C , PAWLOWSKI WALTER P , SCHADT MARK J , SCHEUERMANN MICHAEL R , TISDALE STEPHEN L
IPC: C23C18/20 , C08J5/12 , C08J7/00 , C23C18/16 , C23C18/28 , H05K3/38 , B32B31/12 , C08J7/14 , C25D5/56
Abstract: Certain organic polymeric materials are capable of reversibly accepting or donating electrons from a reducing entity. The redox sites in the polymer accept electrons and, as a result, a change in the properties of the polymer occurs. This change is useful in modifying or etching the polymeric material. The material can be modified by incorporation of metallic seeds into the material at a controlled depth. The seeds are incorporated by interaction of cations of the metals with the redox sites in the polymer, which cause the reduction of the cations to form the neutral metallic seeds. Subsequent exposure of the polymeric material containing the seeds to an electroless bath causes further deposition of metal having the desirable characteristic of good adhesion to the polymeric material. Etching of the polymeric material can be carried out as a result of an increase in solubility of the polymer in aprotic solvents when its redox sites have accepted electrons. The increased solubility allows openings to be etched in certain areas of the polymeric material that have been reduced, leaving other areas unchanged.
-
公开(公告)号:DE69012755D1
公开(公告)日:1994-10-27
申请号:DE69012755
申请日:1990-12-04
Applicant: IBM
Inventor: BUCHWALTER STEPHEN L , GOLDBERG MARTIN J , IYENGAR REVATHI , O'TOOLE TERRENCE R , VIEHBECK ALFRED
-
公开(公告)号:DE68916523D1
公开(公告)日:1994-08-04
申请号:DE68916523
申请日:1989-11-17
Applicant: IBM
-
公开(公告)号:DE69025236T2
公开(公告)日:1996-10-24
申请号:DE69025236
申请日:1990-07-05
Applicant: IBM
Inventor: GOLDBERG MARTIN J , MORRIS DANIEL P , VIEHBECK ALFRED
IPC: C07D209/48 , C07B43/00 , C07B45/00 , C07D471/06 , C07D487/04 , C07D519/00 , C08G73/10 , C08G85/00 , C25B3/25 , H05K1/03 , H05K3/00 , H05K3/46 , C25B3/04
Abstract: Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and methods of fabrication thereof consisting of a thioether, an ester, an ether, a phosphate and a silylether. Electrons are supplied to the carbonyl group conjugated to an aromatic moiety to form a reduced material. The reduced material is contacted with an electrophile which attacks and chemically combines with the carbonyl group conjugated to an aromatic moiety. The parent material can be regenerated by hydrolysis of the derivative. A silyl derivative can be selectively formed on a polyimide material surface which can act as a barrier to an RIE etch of the polyimide material. After etch the polyimide material is regenerated from the silyl derivative.
-
-
-
-
-
-
-
-
-