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公开(公告)号：CA1285664C
公开(公告)日：1991-07-02
申请号：CA567723
申请日：1988-05-26
Applicant: IBM
Inventor： LIN BURN J , MORUZZI ANNE M , ROSENBLUTH ALAN E
IPC: G03F1/00 , G03F7/20 , H01L21/027
Abstract: LITHOGRAPHIC PROCESS USING MASK WITH SMALL OPAQUE OR TRANSPARENT ELEMENTS A lithographic process having improved image quality by employing a mask that includes a plurality of opaque elements or transparent elements that are smaller than the resolution of the lithography to be employed in order to control the transmittance of the actinic light exposure area.
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