公开(公告)号：FR2356975A1

公开(公告)日：1978-01-27

申请号：FR7716799

申请日：1977-05-26

Applicant: IBM

Inventor： LAPADULA CONSTANTIN ,  LIN BURN J

IPC: H05K3/00 ,  G03F7/20 ,  H01L21/027 ,  G03F1/00 ,  H01L21/32 ,  H01L21/70

公开(公告)号：FR2413754A1

公开(公告)日：1979-07-27

申请号：FR7834439

申请日：1978-11-30

Applicant: IBM

Inventor： LIN BURN J ,  LIN YEONG S

IPC: G11C11/14 ,  G11C19/08

公开(公告)号：CA1285664C

公开(公告)日：1991-07-02

申请号：CA567723

申请日：1988-05-26

Applicant: IBM

Inventor： LIN BURN J ,  MORUZZI ANNE M ,  ROSENBLUTH ALAN E

IPC: G03F1/00 ,  G03F7/20 ,  H01L21/027

Abstract: LITHOGRAPHIC PROCESS USING MASK WITH SMALL OPAQUE OR TRANSPARENT ELEMENTS A lithographic process having improved image quality by employing a mask that includes a plurality of opaque elements or transparent elements that are smaller than the resolution of the lithography to be employed in order to control the transmittance of the actinic light exposure area.

公开(公告)号：CA1085968A

公开(公告)日：1980-09-16

申请号：CA300416

申请日：1978-04-04

Applicant: IBM

Inventor： HATZAKIS MICHAEL ,  LAPADULA CONSTANTINO ,  LIN BURN J

IPC: H01L21/30 ,  G03F7/30 ,  G11B7/26 ,  H01L21/027 ,  G01N21/30

Abstract: RESIST DEVELOPMENT CONTROL SYSTEM In the process of developing exposed photoresist on a substrate, the endpoint in developing away all of the exposed positive photoresist or any other positive resist is detected by exposing a wafer with a predetermined pattern including an optical grating or other special pattern formed in the photoresist upon a test area. In a system employing this concept, a beam is diffracted by the optics of the grating only at a first angle until the resist forming the grating is removed by development. Then a sensor is activated when an angle of reflection is unblocked when the grating disappears. The system is then turned off to stop development by the sensor in an automatic system or, by the operator in a manual system. A double exposure technique is employed to produce the grating or other special pattern.

公开(公告)号：FR2396332A1

公开(公告)日：1979-01-26

申请号：FR7817712

申请日：1978-06-07

Applicant: IBM

Inventor： HATZAKIS MICHAEL ,  LAPADULA CONSTANTINO ,  LIN BURN J

IPC: H01L21/30 ,  G03F7/30 ,  G11B7/26 ,  H01L21/027 ,  G03C5/24 ,  G01N23/20 ,  G11C11/14

公开(公告)号：FR2339884A1

公开(公告)日：1977-08-26

申请号：FR7639691

申请日：1976-12-23

Applicant: IBM

Inventor： LIN BURN J ,  MENTESANA JOHN S ,  SANTY WILLIAM G ,  WILCZNSKI JANUSZ S

IPC: H01L21/027 ,  G03B27/20 ,  G03F7/20 ,  H01L21/683 ,  G03F9/00 ,  G03B27/18 ,  H01L21/68

Abstract: A jig for positioning an image mask and image receiving medium which includes a housing having a central bore, first means within the bore for supporting a mask or image receiving medium, a flexible diaphragm, second means for drawing vacuum, and a third means for applying superatmospheric pressure on one side of the diaphragm to deform it towards the first means to ensure proper positioning of the mask and image receiving medium. Also, the process for positioning the mask and image receiving medium is provided.

公开(公告)号：FR2310582A1

公开(公告)日：1976-12-03

申请号：FR7608564

申请日：1976-03-12

Applicant: IBM

Inventor： LIN BURN J ,  LIN YEONG S

IPC: G02F1/09 ,  G03H1/00 ,  G09F9/30 ,  G09G3/00 ,  G09G3/34 ,  G11C13/04 ,  G09X ,  H01F10/02

Abstract: A dynamic pattern display and optical data processing system is provided including magnetic bubble devices which may be operated in real-time to produce two and three dimensional patterns such as holograms, kinoform lenses and complex filters. Th display pattern is obtained by directing a linearly polarized light beam through a combination including a one-quarter waveplate, a plurality of two-dimensional magnetic bubble arrays and another one-quarter wave plate, all combined in a stack arrangement. In one embodiment a combination is provided which functions as a phase filter and in another embodiment including more bubble arrays, the combination functions as a phase and intensity filter. The display patterns are multi-phase or multi-tone (gray scale) and multi-phase in character. Each magnetic bubble array in the phase and phase and intensity filter embodiments constitutes a layer which differs in thickness from the other magnetic bubble layers. Each magnetic bubble array is also electronically driven by its own bubble propagating circuit which produces, in most embodiments, a different "local phase" or "local transmissivity" which is a function of whether a bubble or an empty space is propagated to the location. The number of levels of transmitted phase or intensity and phase is an exponential function of the number of magnetic bubble layers, thus n layers provides 2n steps of transmitted phase or intensity and phase modification and a four layer structure provides a sixteen level phase or phase and intensity display. The electronic portion of the structure may be driven by signals representing mathematical expressions, patterns, manual inputs and the like to generate holograms, kineform lenses, complex filters, three-dimensional television pictures, and other display and optical information processing applications.