公开(公告)号：JPH10104839A

公开(公告)日：1998-04-24

申请号：JP22522597

申请日：1997-08-21

Applicant: IBM

Inventor： STEVEN J HOLMES ,  AHAMADO D KATONANI ,  NIRANJAN M PATEL ,  PAUL A LABIDACKS

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/095 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist having both of positive and negative components and has a lower k-coefft. than a photoresist of either a positive or negative type. SOLUTION: This hybrid photoresist contains either a negative resist or a positive resist in the main part, while the part having the other resist is rather small. For example, a small part of a positive resist contains a negative crosslinking agent, while a negative resist contains functional groups which react as a positive type. By using this hybrid resist, the window which limits the quantity for exposure light can be enlarged, and thereby, the production yield, performance and line density can be improved.

公开(公告)号：JPH10104834A

公开(公告)日：1998-04-24

申请号：JP22504197

申请日：1997-08-21

Applicant: IBM

Inventor： MARK C HEIKEE ,  STEVEN J HOLMES ,  DAVID V HAULICK ,  AHAMADO D KATONANI ,  NIRANJAN M PATEL ,  PAUL A LABIDACKS

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/095 ,  H01L21/02 ,  H01L21/027 ,  H01L21/308

Abstract: PROBLEM TO BE SOLVED: To make it possible to extremely precisely control images with an image size as a target separate form the image size control on a reticle by constituting this regency doubling hybrid phutorsist by, having both of negative type response and positive type response and forming spaces in diffraction regions exposed with an intermediate quantity of irradiation energy. SOLUTION: This hybrid resist simultaneously has both responsiveness of the positive type and negative type to exposure. The solubility of the hybrid resist is increased in the regions, such as regions near the edges of the reticule images, where the exposure intensity is degraded by a diffraction effect by positive responsibility. When the irradiation quantity increases, the negative type responsiveness is dominant. Then, the solubility in the regions where the exposure is large degrades. When a substrate is printed with reticle line patterns, space/line/space patterns are obtd. The space images are 'frequency doubled' in such a manner, the features of double the case of a standard resist are formed. Such hybrid resist exhibits the patterns distinctly different from the positive type resist and the negative type resist.