公开(公告)号：EP2389359A4

公开(公告)日：2012-06-13

申请号：EP10756762

申请日：2010-03-24

Applicant: IBM

Inventor： HUANG WU-SONG ,  POPOVA IRENE ,  VARANASI PUSHKARA RAO ,  VYKLICKY LIBOR

IPC: C07C409/22 ,  G03C1/00

CPC classification number: C08F212/34 ,  C08F212/32 ,  C08F220/22 ,  C08F220/26 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/091

公开(公告)号：WO2009087027A3

公开(公告)日：2009-11-05

申请号：PCT/EP2008067717

申请日：2008-12-17

Applicant: IBM ,  GLODDE MARTIN ,  LIU SEN ,  POPOVA IRENE

Inventor： GLODDE MARTIN ,  LIU SEN ,  POPOVA IRENE

IPC: G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0045 ,  G03F7/0392

Abstract: A photoacid generator compound P+ A-, comprises an antenna group P+ comprising a cation that generates protons upon interaction with light, and A- comprising a weakly coordinating peracceptor-substituted aromatic anion that does not contain fluorine or semi-metallic elements such as boron. In one embodiment, such anions comprise the following compounds 4, 5, 6 and 7, wherein E comprises an electron- withdrawing group and the removal of one proton generates aromaticity. P+ comprises an onium cation that decomposes into a proton and other components upon interaction with photons. P+ may comprise an organic chalcogen onium cation or a halonium cation, wherein the chalcogen onium cation in another embodiment may comprises an oxonium, sulfonium, selenium, tellurium, or onium cation, and the halonium cation may comprise an iodonium, chlorine or bromine onium cation. A novel compound comprises TPS CN5. A photolithographic formulation comprises the photoacid generator in combination with a photolithographic composition such as a photolithographic polymer. The formulation, when on a substrate, is exposed to optical lithographic radiation or ArF (193 nm) or KrF (248 nm) radiation, and developed. A product comprises an article of manufacture made by the method of the invention.

Abstract translation: 光酸产生剂化合物P + A-包含天线基团P +，所述天线基团P +包含在与光相互作用时产生质子的阳离子，和包含不包含氟或半金属元素如硼的弱配位的被取代基取代的芳族阴离子的A-。 在一个实施方案中，这样的阴离子包含以下化合物4,5,6和7，其中E包含吸电子基团并且去除一个质子产生芳香性。 P +包含鎓阳离子，其在与光子相互作用时分解成质子和其他组分。 P +可以包含有机硫属元素鎓阳离子或卤化鎓阳离子，其中在另一个实施方案中硫属元素鎓阳离子可以包含氧鎓，锍，硒，碲或鎓阳离子，并且所述卤鎓阳离子可以包含碘鎓，氯或溴鎓阳离子 。 一种新型化合物包含TPS CN5。 光刻制剂包含与光刻组合物例如光刻聚合物组合的光酸产生剂。 当在基材上时，该配方暴露于光学光刻辐射或ArF（193nm）或KrF（248nm）辐射下并显影。 产品包括通过本发明的方法制造的制品。

公开(公告)号：AT509299T

公开(公告)日：2011-05-15

申请号：AT08870322

申请日：2008-12-17

Applicant: IBM

Inventor： GLODDE MARTIN ,  LIU SEN ,  POPOVA IRENE

IPC: G03F7/004 ,  G03F7/039

Abstract: A photoacid generator compound P+A-, comprises an antenna group P+ comprising a cation that generates protons upon interaction with light, and A- comprising a weakly coordinating peracceptor-substituted aromatic anion that does not contain fluorine or semi-metallic elements such as boron. In one embodiment, such anions comprise the following compounds 4, 5, 6 and 7, wherein E comprises an electron-withdrawing group and the removal of one proton generates aromaticity. P+ comprises an onium cation that decomposes into a proton and other components upon interaction with photons. P+ may comprise an organic chalcogen onium cation or a halonium cation, wherein the chalcogen onium cation in another embodiment may comprises an oxonium, sulfonium, selenium, tellurium, or onium cation, and the halonium cation may comprise an iodonium, chlorine or bromine onium cation. A novel compound comprises TPS CN5. A photolithographic formulation comprises the photoacid generator in combination with a photolithographic composition such as a photolithographic polymer. The formulation, when on a substrate, is exposed to optical lithographic radiation or ArF (193 nm) or KrF (248 nm) radiation, and developed. A product comprises an article of manufacture made by the method of the invention.