公开(公告)号：JP2000089453A

公开(公告)日：2000-03-31

申请号：JP24203899

申请日：1999-08-27

Applicant: IBM

Inventor： WILLIAM R BURUNSUBUORUDO ,  KATNANI AHMAD D ,  PUSHUKARA R VARAANASHII

IPC: H01L21/027 ,  G03F7/004 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a acid-sensitive positive photoresist composition improved in storage life by incorporating the acid-sensitive positive photoresist polymer component and a radiation-sensitive acid-generating component and an inactivated aromatic amine compound. SOLUTION: This photoresist composition comprises the acid-sensitive positive photoresist polymer component selected from a group comprising an acid- sensitive photoresist polymer, an acid-sensitive photoresist polymer having an acid-sensitive compound added, and an acid-insensitive alkali-soluble photoresist polymer having an acid-sensitive alkali-soluble inhibitor added; and the radiation- sensitive acid generating component; and the inactivated aromatic amine compound. It is preferred that the photoresist polymer has an acid-instable group producing an acid, when it is cleft. This composition may contain a solvent for a nonexposed resist.