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公开(公告)号：AT399336T
公开(公告)日：2008-07-15
申请号：AT05804583
申请日：2005-10-18
Applicant: IBM
Inventor： COLBURN MATTHEW , MARTIN YVES , RETTNER CHARLES , VAN KESSEL THEODORE , WICKRAMASINGHE HEMATHA
IPC: G03F7/00
Abstract: A method (and resultant structure) of forming a plurality of masks, includes creating a reference template, using imprint lithography to print at least one reference template alignment mark on all of a plurality of mask blanks for a given chip set, and printing sub-patterns on each of the plurality of mask blanks, and aligning the sub-patterns to the at least one reference template alignment mark.
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