公开(公告)号：JPH01124219A

公开(公告)日：1989-05-17

申请号：JP19076788

申请日：1988-08-01

Applicant: IBM

Inventor： UIRIAMU JIYOSEFU KOOTO ,  DONARUDO MAKUARUPIN KENII ,  MAIKERU RIN KAABAA ,  MAIKERU ARUBAATO RIICHI ,  JIEFURII AREN ROBINSON ,  ROBAATO UEIN SUIITOSAA

IPC: H01L21/302 ,  H01L21/027 ,  H01L21/3065 ,  H01L21/311

Abstract: PURPOSE: To provide spacers on organic mandrels which are formed on a substrate and have vertical side walls without exposing the mandrels to high treating temperatures by adhering organic conformal layers made of a material different from that of the mandrels onto the the mandrels and performing anisotropic etching on the conformal layers. CONSTITUTION: Photoresist mandrels 10 are made of an organic resin material. Since conformal organic layers 20 can be adhered to the mandrels 10 at a room temperature by using such an organic material that can be adhered comformally to the mandrels at a low temperature and etched steps can also be formed at a low temperature, the mandrels 10 are not cured in a heating step. Then spacers 20A are demarcated by performing anisotropic etching on the layers 20 in anisotropic oxygen gas plasma on the side walls of the mandrels 10. After the spacers 20A are demarcated, the mandrels 10 are removed by exposing the mandrels 10 to an etchant which hardly etches the spacers 20A. Therefore, the spacers 20A are left as they are. Then a mask for patterning a conductive layer 14 which lies under etch stop layers 12A and 12B below the spacers 20A is formed by patterning the layers 12A and 12B.