公开(公告)号：JPH05100425A

公开(公告)日：1993-04-23

申请号：JP7064192

申请日：1992-03-27

Applicant: IBM

Inventor： EDOWAADO DAAKO BAABIKU ,  JIEFURII DONARUDO JIEROOMU ,  RONARUDO UEIN NUUNISHIYU ,  SHIYARON RUIIZU NUUNISHIYU ,  JIYUURII ROSUTEISURAFU PARASHI ,  RATSUSERU JIYOZEFU SERIINO

IPC: G03F7/029 ,  G03F7/038 ,  G03F7/075 ,  G03F7/36 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE: To enable a dry development by constituting a composition from a mixture of a polymer epoxide material containing a glycide group, di- or polyfunctional organosilicon material and a specified amount of an onium salt. CONSTITUTION: This composition is composed of the polymer epoxide material containing the glycide group, the di- or polyfunctional organosilicon material and the onium salt in an effective amount for starting a cross-linking reaction of the organosilicon and the polymer epoxide material. In this case, the onium salt is incorporated, for example, by the amount of increasing the sensitivity of the composition to deep UV radiation. The polymer epoxide material is selected from the group of an epoxide novolak having an average structural formula expressed by formulae I and II. Also an reactive group selected from the group consisting of the epoxy group and an active hydrogen group is incorporated in the organosilicon material. In this way, the dry development is enabled and the composition is suitable for an image forming with an all optical lithographic means.