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公开(公告)号：JPS5487646A
公开(公告)日：1979-07-12
申请号：JP13273478
申请日：1978-10-30
Applicant: IBM
IPC: B01J19/00 , C23F1/00 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/316 , H01L21/3213
Abstract: Magnesium oxide is deposited on a substrate as a mask with a pattern of openings which exposes a corresponding pattern of a surface of a substrate which is to be subjected to dry etching.
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