公开(公告)号：JPS51141741A

公开(公告)日：1976-12-06

申请号：JP4871176

申请日：1976-04-30

Applicant: IBM

Inventor： JIYOSEFU EMU HAABURUCHIYATSUKU ,  JIYOSEFU ESU ROOGAN ,  UIRIAMU SHII METSUGAA ,  POORU EMU SHIYAIBURU

IPC: C23F4/00 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/32

公开(公告)号：JPS5487646A

公开(公告)日：1979-07-12

申请号：JP13273478

申请日：1978-10-30

Applicant: IBM

Inventor： POORU EMU SHIYAIBURU ,  JIERARUDEIN SHII SHIYUWARUTSU ,  ROORA BII JIIRINSUKII

IPC: B01J19/00 ,  C23F1/00 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/316 ,  H01L21/3213

Abstract: Magnesium oxide is deposited on a substrate as a mask with a pattern of openings which exposes a corresponding pattern of a surface of a substrate which is to be subjected to dry etching.