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    METHOD OF MANUFACTURING MICROSTRUCTURE
    1.
    发明专利
    METHOD OF MANUFACTURING MICROSTRUCTURE 审中-公开

    公开(公告)号：JP2002303992A

    公开(公告)日：2002-10-18

    申请号：JP2001388858

    申请日：2001-12-21

    Applicant: IBM

    Inventor： SCHMIDT MARKUS

    IPC: G03F7/022 ,  G03F7/039 ,  G03F7/40 ,  G03F7/42 ,  G11B5/127 ,  H01L21/027 ,  H01L21/033 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/4763

    Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing a micrometallic structure having a high aspect ratio. SOLUTION: This method includes a step of manufacturing trenches by photolithography. Polymer chains are formed on the inside surface of the trenches. As a result, the microdimensions in the photolithography process can be reduced to arbitrary dimensions down to zero. This method is a method extremely general in terms of being applicable to arbitrary process inclusive of delineation of the microdimensions by the photolithography. The most general application is the reduction of the reading/writing dimensions of a thin-film magnetic head and this method is usable in the arbitrary technology in which the manufacture of the microstructure having the high aspect ratio is important.

    MANFUFACTURE OF A SOLAR MODULE
    2.
    发明申请
    MANFUFACTURE OF A SOLAR MODULE 审中-公开
    太阳能模块的制造

    公开(公告)号：WO2014026799A2

    公开(公告)日：2014-02-20

    申请号：PCT/EP2013063995

    申请日：2013-07-03

    Applicant: IBM ,  IBM DEUTSCHLAND

    Inventor： SCHMIDT MARKUS ,  HAAG MICHAEL ,  KELLMANN RUEDIGER

    IPC: H01L31/0224

    CPC classification number: H01L31/02327 ,  H01L31/022425 ,  H01L31/054 ,  H01L31/0547 ,  Y02E10/52

    Abstract: A photovoltaic cell with reduced shading and series resistance for increased efficiency. A contact grid containing a set of optical structures is embedded into a substrate. An array of electrical contacts is aligned and in electrical communication with the optical structures and provides electrical communication between the active layer and the substrate.

    Abstract translation: 具有减少阴影和串联电阻的光伏电池可提高效率。 包含一组光学结构的接触栅格被嵌入到衬底中。 电触点阵列与光学结构对准并电连通，并提供有源层和衬底之间的电连通。

    METHOD FOR THE MANUFACTURE OF MICRO STRUCTURES
    3.
    发明申请
    METHOD FOR THE MANUFACTURE OF MICRO STRUCTURES 审中-公开
    微结构的制造方法

    公开(公告)号：WO02054458A3

    公开(公告)日：2003-03-27

    申请号：PCT/EP0115256

    申请日：2001-12-21

    Applicant: IBM ,  IBM DEUTSCHLAND ,  SCHMIDT MARKUS

    Inventor： SCHMIDT MARKUS

    IPC: G03F7/022 ,  G03F7/039 ,  G03F7/40 ,  G03F7/42 ,  G11B5/127 ,  H01L21/027 ,  H01L21/033 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/4763

    CPC classification number: B81C1/00619 ,  G03F7/40 ,  H01L21/0273

    Abstract: A method for the manufacture of micro metallic structures having high aspect ratios is provided, wherein said method comprises the step of photolithographically producing trenches in a substrate. Polymer chains are formed on the inner surface of said trenches. Thus, the critical dimensions in the photolithographical process can be reduced to any dimension down to zero. The method is quite general in its application to any process that includes the definition of a critical dimension by photolithography. Immediate applications are the reduction of the read and write dimensions in thin film magnetic heads, but the invention can be used in any technology where the manufacture of microstructures having a high aspect ratio is of interest.

    Abstract translation: 提供一种用于制造具有高纵横比的微型金属结构的方法，其中所述方法包括在衬底中光刻制造沟槽的步骤。 聚合物链形成在所述沟槽的内表面上。 因此，光刻工艺中的临界尺寸可以降低到零至零的任何尺寸。 该方法在其应用于包括通过光刻术定义临界尺寸的任何工艺方面是相当普遍的。 立即应用是在薄膜磁头中减小读取和写入尺寸，但是本发明可以用于制造具有高纵横比的微结构感兴趣的任何技术中。

    Absorber device
    5.
    发明专利
    Absorber device 未知

    公开(公告)号：GB2516011A

    公开(公告)日：2015-01-14

    申请号：GB201311815

    申请日：2013-07-02

    Applicant: IBM

    Inventor： SCHMIDT MARKUS ,  EICKELMANN HANS-JUERGEN ,  KELLMANN RUEDIGER ,  KUEHL HARTMUT ,  HOVEL HAROLD JOHN ,  STEEN STEVEN ERIK

    IPC: H01L31/052 ,  H01L31/0232

    Abstract: The invention relates to concentrated photovoltaics for thin film solar cell devices. The thin film solar cell device 100 comprises a substrate 10 with one or more thin film radiation absorbers 12 and a cover 20 which covers the substrate and the absorbers. Mounted to this is an integrated optical system 14, comprising at least one optical element 16 used for concentrating the light onto the solar cell. The optical element 16 and the corresponding radiation absorbers 12 are aligned with respect to their optical axis 24, such that an incoming radiation 22 is directed onto the radiation absorber 12 by the optical system 14. The device can have a second optical system 18 which is arranged between the first optical element and the radiation absorbers. The first optical system may be integrated at a top surface of the cover medium, and can comprise of a lens array, whilst the second optical system can comprise a light guide. The second optical element can be integrated with the top of the radiation absorbing device.

    6.
    发明专利
    未知

    公开(公告)号：DE10197137B4

    公开(公告)日：2008-07-31

    申请号：DE10197137

    申请日：2001-12-21

    Applicant: IBM

    Inventor： SCHMIDT MARKUS

    IPC: G03F7/022 ,  G03F7/40 ,  G03F7/039 ,  G03F7/42 ,  G11B5/127 ,  H01L21/027 ,  H01L21/033 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/4763

    Abstract: A method for the manufacture of micro metallic structures having high aspect ratios is provided, wherein said method comprises the step of photolithographically producing trenches in a substrate. Polymer chains are formed on the inner surface of said trenches. Thus, the critical dimensions in the photolithographical process can be reduced to any dimension down to zero. The method is quite general in its application to any process that includes the definition of a critical dimension by photolithography. Immediate applications are the reduction of the read and write dimensions in thin film magnetic heads, but the invention can be used in any technology where the manufacture of microstructures having a high aspect ratio is of interest.

    Method for the manufacture of micro structures
    7.
    发明专利
    Method for the manufacture of micro structures 未知

    公开(公告)号：AU2002234603A1

    公开(公告)日：2002-07-16

    申请号：AU2002234603

    申请日：2001-12-21

    Applicant: IBM

    Inventor： SCHMIDT MARKUS

    IPC: G03F7/022 ,  G03F7/039 ,  G03F7/40 ,  G03F7/42 ,  G11B5/127 ,  H01L21/027 ,  H01L21/033 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/4763

    Abstract: A method for the manufacture of micro metallic structures having high aspect ratios is provided, wherein said method comprises the step of photolithographically producing trenches in a substrate. Polymer chains are formed on the inner surface of said trenches. Thus, the critical dimensions in the photolithographical process can be reduced to any dimension down to zero. The method is quite general in its application to any process that includes the definition of a critical dimension by photolithography. Immediate applications are the reduction of the read and write dimensions in thin film magnetic heads, but the invention can be used in any technology where the manufacture of microstructures having a high aspect ratio is of interest.

    Monolithically integrated thin-film device with a solar cell, an integrated battery and a controller
    8.
    发明专利
    Monolithically integrated thin-film device with a solar cell, an integrated battery and a controller 未知

    公开(公告)号：GB2522408A

    公开(公告)日：2015-07-29

    申请号：GB201400531

    申请日：2014-01-14

    Applicant: IBM

    Inventor： SCHMIDT MARKUS ,  EICKELMANN HANS-JUERGEN ,  KUEHL HARTMUT ,  KELLMANN RUEDIGER ,  BREDEL HERBERT

    IPC: H01L31/053 ,  H01L27/142 ,  H01L31/04

    Abstract: A thin-film monolithically integrated solar module 100a comprising a thin-film solar cell 104, having at least one solar diode, on a transparent substrate 102, a thin-film energy storage device 106, and an electronic controller 108 comprising at least one thin-film transistor 110 above the thin-film energy storage device 106, wherein the electronic controller 108 is electrically connected to the thin-film solar cell 104 and the thin-film energy storage device 106 by vias 148. The thin-film solar cell 104 may comprise a transparent front-side electrode 120, a photovoltaic layer 122 and a back-side electrode 124. The module may also comprise a first dielectric layer 128. The energy storage device 106 may comprise a lower electrode 130, an active energy storage layer 132, and an upper electrode 134. Also disclosed is a method for manufacturing the above described device.

    9.
    发明专利
    未知

    公开(公告)号：DE10197137T1

    公开(公告)日：2003-12-24

    申请号：DE10197137

    申请日：2001-12-21

    Applicant: IBM

    Inventor： SCHMIDT MARKUS

    IPC: G03F7/022 ,  G03F7/039 ,  G03F7/40 ,  G03F7/42 ,  G11B5/127 ,  H01L21/027 ,  H01L21/033 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/4763

    Abstract: A method for the manufacture of micro metallic structures having high aspect ratios is provided, wherein said method comprises the step of photolithographically producing trenches in a substrate. Polymer chains are formed on the inner surface of said trenches. Thus, the critical dimensions in the photolithographical process can be reduced to any dimension down to zero. The method is quite general in its application to any process that includes the definition of a critical dimension by photolithography. Immediate applications are the reduction of the read and write dimensions in thin film magnetic heads, but the invention can be used in any technology where the manufacture of microstructures having a high aspect ratio is of interest.

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