公开(公告)号：JPH10168329A

公开(公告)日：1998-06-23

申请号：JP16405297

申请日：1997-06-20

Applicant: IBM

Inventor： ANGELOPOULOS MARIE ,  GELORME JEFFREY D ,  NEWMAN THOMAS H ,  PATEL NIRANJAN M ,  SEEGER DAVID E

IPC: C08G61/12 ,  C08G61/10 ,  C08G75/02 ,  C08G75/04 ,  C08J3/28 ,  C08L33/00 ,  C08L33/02 ,  C08L41/00 ,  C08L79/00 ,  C08L101/00 ,  C08L101/02 ,  C08L101/12 ,  G03F7/038 ,  G03F7/09 ,  H01B1/12

Abstract: PROBLEM TO BE SOLVED: To obtain a conductive polymer composition containing a specific polyacid and a specific polymer, capable of being cross-linked, improved in solubility in water, and useful for conductive electron beam resists, photoresists, etc. SOLUTION: This water-soluble conductive polymer composition comprises (A) a polyacid having acid groups selected from carboxyl groups, phosphate groups, phosphate groups, borate groups, sulfate groups and sulfonate groups, such as poly(styrenesulfonic acid), and (B) a polymer selected from the (non) substituted homopolymers or (non)substituted copolymers of aniline, thiophene, pyrrole or p-phenylene sulfide, having one or more conjugated parts constituting conjugated basic atom-containing repeating units. Therein, the number of acidic groups in the polyacid is larger than the number of proton-addable basic atoms in the polymer. An aqueous solution containing the composition in a concentration of 5-10wt.% is preferably prepared and further mixed with an oxidizing agent/a polymerization initiator.