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    Apparatus for providing a finished surface on workpieces
    3.
    发明授权
    Apparatus for providing a finished surface on workpieces 失效
    在工件上提供完整表面的设备

    公开(公告)号：US3626640A

    公开(公告)日：1971-12-14

    申请号：US3626640D

    申请日：1970-03-23

    Applicant: IBM

    Inventor： GOETZ FRED E ,  DRUZBA PERRY R JR ,  HAUSE JAMES R ,  SEELEY GERARD

    IPC: B24B37/10 ,  B24B37/04 ,  B24B7/00

    CPC classification number: B24B37/105 ,  B24B27/0023

    Abstract: THIS DISCLOSURE INCLUDES APPARATUS FOR PREPARING THE SURFACE OF A WORKPIECE. THE DISCLOSURE TEACHES THE PROVISION OF A NOVEL WORKPIECE CARRIER FOR ENGAGING THE WORKPIECE, AND OSCAILLATING THE WORKPIECE HOLDER RELATIVE TO A FINISHING SURFACE WHILE SIMULTANEOUSLY PROVIDING RELATIVE LINEAR MOVEMENT BETWEEN THE WORKPIECE HOLDER AND THE FISHING SURFACE. THE APPARATUS INCLUDES A CARRIER HAVING A DRIVER FOR MOVING THE CARRIER ALONG A LINEAR PATH OF TRAVEL. A ROTABLE MOUNT WHICH IS CARRIED BY THE CARRIER INCLUDES A DEPENDING WORKPIECE RECEIVER WHICH IS ROTABLY CONNECTED TO THE MOUNT, THE RECEIVER BEING MOUNTED ECCENTRICALLY WITH RESPECT TO THE CARRIER. STRUCTURE IS PROVIDED FOR IMPARTING RORATION TO THE MOUNT AND SEPARATE ELEMENTS SUCH AS SPRINGS ARE CONNECTED BETWEEN THE RECEIVER AND THE CARRIER SO AS TO INHIBIT ROTATION OF THE RECEIVER WHILE PERMITTING OSCILATION THEREOF. IN THIS MANNER, AN ARTICLE BEING HELD BY THE RECEIVER MAY BE ENGAGED AND OSCILLATED AGAINST THE FINISHING SURFACE IN SUBSTANTIALLY COPLANAR RELATIONSHIP THEREWITH. IN ADDITION, AS HEREIN DISCLOSED, THE FINISHING TABLE UPON WHICH THE CARRIERS RIDE MAY BE PROVIDED WITH A PLURALITY OF FINISHING SURFACES, EACH ADAPTED FOR DIFFERENT FINISHING OPERATIONS WITH INTERMEDIATE CLEANING SURFACES TO CLEAN THE WORKPIECE OF ANY RESIDE ADHEARING THERETO FROM A PREVIOUS FINISHING SURFACE.

    A method for providing a finished surface on workpieces
    4.
    发明授权
    A method for providing a finished surface on workpieces 失效
    一种在工件上提供精加工表面的方法

    公开(公告)号：US3659386A

    公开(公告)日：1972-05-02

    申请号：US3659386D

    申请日：1970-03-16

    Applicant: IBM

    Inventor： GOETZ FRED E ,  DRUZBA PERRY R JR ,  HAUSE JAMES R ,  SEELEY GERARD

    IPC: B24B37/10 ,  B24B1/00

    CPC classification number: B24B37/105 ,  B24B27/0023

    Abstract: This patent discloses a method of preparing the surface of a workpiece. The disclosed method teaches the provision of a novel workpiece carrier for engaging the workpiece, and oscillating the workpiece holder relative to a finishing surface while simultaneously providing relative linear movement between the workpiece holder and the finishing surface. The apparatus, by which the method is performed, includes a carrier having drive means for moving the carrier along a linear path of travel. A rotatable mount which is carried by the carrier includes a depending workpiece receiver which is rotatably connected to the mount, the receiver being mounted eccentrically with respect to the carrier. Means are provided for imparting rotation to the mount and separate means such as springs are connected between the receiver and the carrier so as to inhibit rotation of the receiver while permitting oscillation thereof. In this manner, an article being held by the receiver may be engaged and oscillated against the finishing surface in substantially coplanar relationship therewith. In addition, as herein disclosed, the finishing table upon which the carriers ride may be provided with a plurality of finishing surfaces, each adapted for different finishing operations with intermediate cleaning surfaces to clean the workpiece of any residue adhering thereto from a previous finishing surface.

    Abstract translation: 该专利公开了一种制备工件表面的方法。 所公开的方法教导了提供用于接合工件的新型工件载体，并且相对于精加工表面摆动工件保持件，同时在工件保持器和精加工表面之间提供相对的线性运动。 执行该方法的装置包括具有用于沿行进路线移动载体的驱动装置的载体。 由托架承载的可旋转安装件包括可旋转地连接到安装座的悬挂工件接收器，接收器相对于托架偏心安装。 提供了用于向安装座施加旋转的装置，并且诸如弹簧之类的分离装置连接在接收器和载体之间，以便禁止接收器的旋转，同时允许其振动。 以这种方式，由接收器保持的物品可以以与其完全共面的关系相对于精加工表面进行接合和摆动。 此外，如本文所公开的那样，载具搭接的精加工台可以设置有多个精加工表面，每个精加工表面适用于具有中间清洁表面的不同的精加工操作，以从先前的精加工表面清洁附着在其上的任何残余物的工件。

    8.
    发明专利
    未知

    公开(公告)号：DE3668188D1

    公开(公告)日：1990-02-15

    申请号：DE3668188

    申请日：1986-10-07

    Applicant: IBM

    Inventor： BARBEE STEVEN GEORGE ,  DEVINE GREGORY PAUL ,  PATRICK WILLIAM JOHN ,  SEELEY GERARD

    IPC: C23C16/40 ,  C23C16/448 ,  C23C16/52 ,  C23C14/54 ,  C23C14/24 ,  C23C14/34 ,  C23C16/44 ,  H05K3/16

    Abstract: The system for forming a uniform layer of a material from a vapor phase onto the surface of an object at a high rate of deposition includes a reservoir (10) for heating a material from which gas is propagated; a low pressure reactor (20) wherein said layer is formed; connecting means (18) between said reservoir and said reactor; means connected to the outlet of said reactor for creating a vacuum therein and causing said gas to flow from said reservoir through said connecting means to said reactor; first pressure control means at the outlet of said reservoir for maintaining the pressure of said gas at the reservoir end of said connecting means at a first value; and second pressure control means at the inlet of said reactor for maintaining the pressure of said gas thereat at a second value by adjusting said means for creating a vacuum, thereby providing a constant mass flow rate of said gas into said reactor. The method of forming a layer of material from a gas upon the surface of an object comprises: heating a reservoir to a temperature sufficient to vaporize a material from which said gas is formed; creating a vacuum in a reactor containing said object to cause said gas to flow from said reservoir through a connecting means to said reactor; and maintaining the reservoir outlet pressure and the reactor inlet pressure at constant values, thereby providing a constant mass flow rate of said gas into said reactor.

    VACUUM DEPOSITION SYSTEM WITH IMPROVED MASS FLOW CONTROL
    9.
    发明专利
    VACUUM DEPOSITION SYSTEM WITH IMPROVED MASS FLOW CONTROL 未知

    公开(公告)号：CA1228268A

    公开(公告)日：1987-10-20

    申请号：CA509774

    申请日：1986-05-22

    Applicant: IBM

    Inventor： BARBEE STEVEN G ,  DEVINE GREGORY P ,  PATRICK WILLIAM J ,  SEELEY GERARD

    IPC: C23C16/40 ,  C23C16/448 ,  C23C16/52 ,  C23C14/54

    Abstract: FI9-83-093 VACUUM DEPOSITION SYSTEM WITH IMPROVED MASS FLOW CONTROL A system and method for forming a uniform layer of a material from a vapor phase onto the surface of an object at a high rate of deposition includes a heated reservoir for vaporizing the material to be deposited, a reactor containing the objects to be coated, and a vacuum device for flowing the gaseous material from the reservoir to the reactor. The mass flow rate of the gas from the reservoir is held constant by precisely controlling the pressure at the outlet of the reservoir and at the inlet of the reactor. In one embodiment the upstream pressure is controlled by a valve responsive to a pressure sensor at the reservoir outlet, and the downstream pressure is controlled by adjusting the vacuum in the reactor as measured by a pressure sensor at the reactor inlet. A vacuum bypass line around the reactor is provided to stabilize the upstream pressure prior to admitting the gas to the reactor when a deposition cycle is commenced, and the connection between the reservoir and the reactor, and the flow control valves and pressure sensors in the flow path are maintained at a temperature sufficient to prevent condensation of the vapor downstream of the reservoir.

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