公开(公告)号：CA1290087C

公开(公告)日：1991-10-01

申请号：CA507288

申请日：1986-04-22

Applicant: IBM

Inventor： SKINNER MICHAEL P ,  BRUNSVOLD WILLIAM R ,  CROCKATT DALE M

IPC: G03C1/00 ,  C08J3/09 ,  G03F7/004 ,  G03F7/039 ,  C08L33/24 ,  G03F7/16

Abstract: FILM-FORMING COMPOSITIONS COMPRISING POLYGLUTAIMIDE This invention relates to a composition of matter useful for applying polyglutarimide-comprised films to a surface, and to a method of determining what the composition of matter should be to obtain a particular applied dry film thickness, wherein the dry film has a uniform thickness profile. In particular, the present invention enables the spin-casting of films comprised of polyglutarimide to film thicknesses greater than 1 micrometer. Films of thicknesses greater than 1 micrometer have particular use in the microelectronics industry, for applications such as planarizing underlayers, metal lift off layers, and as part of multilayer resist structures where it is desired to obtain a high aspect ratio for the resist structure.