MANUFACTURE OF POROUS DIELECTRIC
    1.
    发明专利

    公开(公告)号:JP2001067963A

    公开(公告)日:2001-03-16

    申请号:JP2000222629

    申请日:2000-07-24

    Applicant: IBM

    Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method of a porous dielectric of low dielectric constant having uniform dielectric property throughout the body and the peripheral surface. SOLUTION: A mixture of a solvent, sacrificial nano particles 13 in first quantity and structural nano particles 11 in second quantity is prepared first. The structural nano particles 11 contain organic components. The mixture is concentrated to form a lattice structure with scattered sacrificial nano particles 13. The structural nano particles 11 are fused to make the structural nano particles 11 and the lattice structure rigid. The sacrificial nano particles 13 are removed from the lattice structure to leave cavities in the lattice structure. Finally, the surfaces of the cavities are coated with a hydrophobic material. A device constructed in this method is also described.

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