公开(公告)号：EP1450153A4

公开(公告)日：2009-03-18

申请号：EP02783676

申请日：2002-11-28

Applicant: IBM

Inventor： UDA MITSURU ,  TERAKAWA KAZUNARI ,  SUZUKI AKIRA ,  MORITA CHIAKI ,  YAMADA YASUHARU ,  HAYAND TERUHIKO

IPC: G01N21/956 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66

CPC classification number: G03F7/70616 ,  G01N21/956 ,  G03F7/70641

Abstract: The profile error (deviation) of a pattern having an uneven section is detected simply and highly accurately. A pattern (32) inspection device for detecting the profile error of a pattern having an uneven section, comprising a plate (30) to mount a pattern thereon, light sources (40, 42, 44) capable of changing angles of light beams applied to the pattern within a range of 15 to 75 degrees with respect to the top surface of the pattern, and light receivers (52, 54) capable of receiving light beams reflected from the pattern at angles within a range of 15 to 75 degrees, characterized in that the profile error of the pattern is detected from quantities of reflected light from edges between the top surfaces and the side surfaces of respective portions of the pattern.

公开(公告)号：JP2002168795A

公开(公告)日：2002-06-14

申请号：JP2000344026

申请日：2000-11-10

Applicant: IBM

Inventor： UDA MITSURU ,  TERAKAWA KAZUNARI ,  SUZUKI AKIRA

IPC: G01B11/24 ,  G01N21/956 ,  G03F7/26 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To inspect a formation defect of a resist pattern formed on an antireflection film by diffracted light of light with which the resist pattern is irradiated. SOLUTION: A light source part S for irradiating the resist pattern 12 with light Lin at an incident angle θ below 45 degrees relative to the upper surface of the resist pattern 12 is used. An inspector (P) for determining the existence of the formation defect of the resist pattern 12 is positioned on the light source part S side.

公开(公告)号：AU2002349599A1

公开(公告)日：2003-06-10

申请号：AU2002349599

申请日：2002-11-28

Applicant: IBM

Inventor： SUZUKI AKIRA ,  MORITA CHIAKI ,  YAMADA YASUHARU ,  HAYANO TERUHIKO ,  UDA MITSURU ,  TERAKAWA KAZUNARI

IPC: G01N21/956 ,  G03F7/20 ,  H01L21/66 ,  H01L21/027

Abstract: Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.

公开(公告)号：AT514940T

公开(公告)日：2011-07-15

申请号：AT02783676

申请日：2002-11-28

Applicant: IBM

Inventor： UDA MITSURU ,  TERAKAWA KAZUNARI ,  SUZUKI AKIRA ,  MORITA CHIAKI ,  YAMADA YASUHARU ,  HAYAND TERUHIKO

IPC: G01N21/956 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66

Abstract: Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.