公开(公告)号：EP1450153A4

公开(公告)日：2009-03-18

申请号：EP02783676

申请日：2002-11-28

Applicant: IBM

Inventor： UDA MITSURU ,  TERAKAWA KAZUNARI ,  SUZUKI AKIRA ,  MORITA CHIAKI ,  YAMADA YASUHARU ,  HAYAND TERUHIKO

IPC: G01N21/956 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66

CPC classification number: G03F7/70616 ,  G01N21/956 ,  G03F7/70641

Abstract: The profile error (deviation) of a pattern having an uneven section is detected simply and highly accurately. A pattern (32) inspection device for detecting the profile error of a pattern having an uneven section, comprising a plate (30) to mount a pattern thereon, light sources (40, 42, 44) capable of changing angles of light beams applied to the pattern within a range of 15 to 75 degrees with respect to the top surface of the pattern, and light receivers (52, 54) capable of receiving light beams reflected from the pattern at angles within a range of 15 to 75 degrees, characterized in that the profile error of the pattern is detected from quantities of reflected light from edges between the top surfaces and the side surfaces of respective portions of the pattern.

公开(公告)号：EP0831356A4

公开(公告)日：1998-11-04

申请号：EP95919659

申请日：1995-05-29

Applicant: IBM

Inventor： SHINOHARA MASAMI ,  UDA MITSURU ,  ENAMI KUNIO

IPC: G02F1/1339 ,  H04N9/31 ,  G02F1/13

CPC classification number: H04N9/3105 ,  G02F1/13394

Abstract: A projection liquid crystal display using liquid crystal light valves, having columnar spacers formed in pixel array regions, and designed to prevent deterioration of contrast and minimize persistence. Three liquid crystal light valves corresponding to red, green and blue include a plurality of columnar spacers for keeping predetermined cell gaps in pixel array regions. The columnar spacers in the pixel array regions are disposed in such a manner that they do not overlap when projected on a screen.

公开(公告)号：JP2001174409A

公开(公告)日：2001-06-29

申请号：JP35545599

申请日：1999-12-15

Applicant: IBM

Inventor： UDA MITSURU ,  NOGAMI TETSUYA ,  IGUCHI TAKESHI

IPC: H01L21/027 ,  G01N21/84 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To provide a lighting apparatus for inspection capable of visually and clearly detecting whether or not a defect such as defocussing inferiority or the like is present on a fine surface to be processed of the resist pattern or the like formed on a semiconductor substrate such as a wafer or the like and especially enhanced in visibility by widening the angle of visibility. SOLUTION: The two-wavelength tube having peak wavelengths of respective colors in a complementary color relation and capable of emitting two kinds of coherent lights narrow in wavelength region is provided. The two-wavelength tube is especially constituted of a fluorescent tube coated with a plurality of phosphors capable of emitting two kinds of coherent lights or a discharge tube filled with gas capable of emitting two kinds of coherent lights. A surface 16 to be processed of a predetermined pattern formed on a substrate 18 is irradiated with the coherent lights 14 from the light source of the lighting apparatus 12 for inspection and, on the basis of the diffracted light 22 from the fine surface 16 to be processed, it is judged whether or not the fine surface 16 to be processed is deformed from the predetermined pattern. The lighting apparatus 12 is constituted so that the irradiating coherent lights 14 have peak wavelengths of respective colors in complementary color relation and have a narrow wavelength region.

公开(公告)号：JP2009139333A

公开(公告)日：2009-06-25

申请号：JP2007318735

申请日：2007-12-10

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： UDA MITSURU ,  KOHAYASE ATSUSHI

IPC: G01B11/30 ,  G01N21/956 ,  H01L21/66

CPC classification number: G01N21/8806 ,  G01N21/8422 ,  G01N21/9501

Abstract: PROBLEM TO BE SOLVED: To easily detect flatness of a surface of an inspection object with high sensitivity.
SOLUTION: This macro inspection device 100 includes: a stage 1 for mounting an inspection object 2 thereon; a light source 5 emitting light to an upper surface of the inspection object from an optionally-selected angular direction with respect to the upper surface; and a line sensor 9 arranged in a selected angular direction with respect to the inspection object to adjust the optical axis to an edge of a region on the upper surface irradiated with the light source, and receiving light reflected from the edge of the region on the upper surface of the inspection object.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了容易地以高灵敏度检测检查对象的表面的平坦度。 ＆lt; P＆gt;解决方案：该宏观检查装置100包括：用于在其上安装检查对象2的台1; 从相对于上表面的可选择的角度方向将光发射到检查对象的上表面的光源5; 以及相对于检查对象以选定的角度方向布置的线传感器9，以将光轴调整到用光源照射的上表面上的区域的边缘，并且接收从该光源的该区域的边缘反射的光 检查对象的上表面。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JPH06120201A

公开(公告)日：1994-04-28

申请号：JP26991392

申请日：1992-10-08

Applicant: IBM JAPAN

Inventor： UDA MITSURU

IPC: G03F1/68 ,  G03F1/80 ,  G03F7/40 ,  H01L21/306 ,  G03F1/08

Abstract: PURPOSE:To enable application to fine working by controlling side etching, by a method wherein, when a pattern is formed by exposing a resist layer turning to a mask, a half exposed part is arranged on the boundary between an exposed part and an unexposed part in the resist layer. CONSTITUTION:A resist layer 21 is formed on a layer 22 to be worked, and exposed in a pattern 31 containing an exposed part 32, an unexposed part 34, and a half exposed part 33 on the boundary between the exposed part 32 and the unexposed part 34. Then the layer 22 to be worked is subjected to wet etching by using the resist layer 21 as a mask. In the process of the wet etching, the half exposed part 33 in the resist layer 21 is etched and eliminated. For example, by irradiation of light, the pattern 31 of a contact hole is formed on the resist layer 21 arranged on the layer 22 to be worked composed of polyimide. The pattern 31 is formed so as to consist of the completely exposed part 32 at the central part B, and the half exposed part 33 in the peripheral part.

公开(公告)号：JP2001100192A

公开(公告)日：2001-04-13

申请号：JP26440399

申请日：1999-09-17

Applicant: IBM

Inventor： SHINOHARA MASAKI ,  UDA MITSURU ,  IVAN GEORGE COLGAN

IPC: G02F1/1333 ,  G02F1/1335 ,  G02F1/135 ,  G02F1/136 ,  G02F1/1362 ,  G02F1/1368

Abstract: PROBLEM TO BE SOLVED: To effectively shield incident light from a gap part of a light reflection layer in a liquid crystal light valve of a liquid crystal display device, especially of a reflective liquid crystal display device. SOLUTION: In the liquid crystal display device having a semiconductor substrate, a counter substrate, the light reflection layer and a liquid crystal, the liquid crystal light valve provided with an effective light shielding means is constructed by arranging a light absorption body layer and a light shielding body placed between the light absorption body layer and the light reflection layer.

公开(公告)号：JP2002168795A

公开(公告)日：2002-06-14

申请号：JP2000344026

申请日：2000-11-10

Applicant: IBM

Inventor： UDA MITSURU ,  TERAKAWA KAZUNARI ,  SUZUKI AKIRA

IPC: G01B11/24 ,  G01N21/956 ,  G03F7/26 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To inspect a formation defect of a resist pattern formed on an antireflection film by diffracted light of light with which the resist pattern is irradiated. SOLUTION: A light source part S for irradiating the resist pattern 12 with light Lin at an incident angle θ below 45 degrees relative to the upper surface of the resist pattern 12 is used. An inspector (P) for determining the existence of the formation defect of the resist pattern 12 is positioned on the light source part S side.

公开(公告)号：JP2001141657A

公开(公告)日：2001-05-25

申请号：JP30876699

申请日：1999-10-29

Applicant: IBM

Inventor： UDA MITSURU ,  YAMAGUCHI TAKESHI ,  SHINOHARA MASAKI

IPC: G01B11/30 ,  G01B11/24 ,  G01N21/84 ,  G01N21/956 ,  H01L21/027 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To provide an illumination device for macroinspection, by which whether a defocus defect or the like is contained on the face to be fine worked of a resist pattern or the like formed on a semiconductor substrate such as a wafer or the like can be inspected especially visually and clearly, and to provide an apparatus and a method for inspection in which the obtained illumination device for macroinspection is used. SOLUTION: This macroinspection apparatus 10 comprises an illumination device 12 for macroinspection, which is equipped with a light source used to irradiate coherent light 14. The macroinspection apparatus comprises a support means 20 used to support a substrate 18 which is irradiated with the coherent light 14 from the illumination device 12 for macroinspection and on which the face 16 to be fine worked of a prescribed pattern is formed. The macroinspection apparatus comprises a judgment means 24 in which whether a pattern formed on the substrate 18 is deformed from the prescribed pattern is judged by diffracted light 22 from the face 16 to be fine worked. The illumination device 12 for macroinspection is constituted of a device which irradiates light containing coherent light in two colors in the relationship of complementary colors.

公开(公告)号：JP2548873B2

公开(公告)日：1996-10-30

申请号：JP26991392

申请日：1992-10-08

Applicant: IBM JAPAN

Inventor： UDA MITSURU

IPC: G03F1/68 ,  G03F1/80 ,  G03F7/40 ,  H01L21/306

公开(公告)号：DE69942261D1

公开(公告)日：2010-06-02

申请号：DE69942261

申请日：1999-02-26

Applicant: IBM

Inventor： SHINOHARA MASAMI ,  UDA MITSURU

IPC: G02F1/1335 ,  G09F9/35 ,  G02F1/13 ,  G02F1/1333 ,  G02F1/1343 ,  G02F1/136 ,  G02F1/1368 ,  H01L21/321

Abstract: A reflection type liquid crystal device has a planarized light reflective face and a reduced reflection loss. An active matrix reflective liquid crystal device comprises: an array substrate which includes switching elements corresponding to pixels and an array of pixel electrodes 32 connected to the switching elements; and an opposing substrate which has a transparent electrode opposite the array of pixel electrodes 32 with a liquid crystal layer inserted therebetween. Each of the pixel electrodes 32 includes an array of electrode studs, i.e., divided electrode elements 68. The regions between the electrodes 68 are filled with an insulating material 64, and the surface of the stud array is planarized by chem-mech polishing. A dielectric light reflective film is formed on the planarized surface of the stud array, and a liquid crystal molecule alignment film is deposited thereon.