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公开(公告)号:US3556643A
公开(公告)日:1971-01-19
申请号:US3556643D
申请日:1969-08-15
Applicant: IBM
Inventor: TIBBETTS RAYMOND E , WILCZYNSKI JANUSZ S
CPC classification number: G02B13/00
Abstract: A LENS GROUP IS DESCRIBED FOR USE AS A REDUCTION LENS. THE LENS GROUP CONSISTS OF SEVEN LENS ELEMENTS. THE FIRST AND SECOND LENS ELEMENTS ARE MENISCUS SINGLET LENSES. THE THIRD AND FOURTH ELEMENTS ARE CEMENTED TOGETHER TO FORM A MENISCUS DOUBLET LENS AS ARE THE FIFTH AND SIXTH LENS ELEMENTS. THE SEVENTH LENS ELEMENT IS A BI-CONVEX LENS. THE LENS GROUP HAS AN EXTREMELY HIGH UNIFORM RESOLUTION OVER THE IMAGE FIELD AND AN EXCEEDINGLY FLAT FIELD WITH MINIMUM ZONAL ASTIGMATISM. THE CONSTRUCTIONAL DATA OF THE LENS ELEMENTS HAVE UPPER AND LOWER LIMITS AND SEVEN EMBODIMENTS OF LENS GROUPS OF THE PRESENT INVENTION ARE SET FORTH, ALL OF WHICH PROVIDE THE HIGH RESOLUTION AND MINIMAL ZONAL ASTIGMATISM.
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公开(公告)号:US3602578A
公开(公告)日:1971-08-31
申请号:US3602578D
申请日:1970-04-02
Applicant: IBM
Inventor: TIBBETTS RAYMOND E , WILCZYNSKI JANUSZ S
CPC classification number: G02B13/00
Abstract: A lens group is described for use as a reduction lens, consisting of 10 lens elements. The first and second elements are cemented together to form a meniscus doublet lens as are the third and fourth, fifth and sixth, eighth and ninth elements. The seventh element is a positive meniscus lens and the 10th element is a biconcave lens. The lens group has very high uniform resolution over the flat image field and has unmeasurable distortion, less than a hundredth part of the wavelength of light. The constructional data of the lens elements have upper and lower limits and nine embodiments of lens groups of the present invention are set forth, all of which provide the high resolution and exceptionally low distortion value.
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公开(公告)号:US3588228A
公开(公告)日:1971-06-28
申请号:US3588228D
申请日:1969-08-15
Applicant: IBM
Inventor: WILCZYNSKI JANUSZ S , TIBBETTS RAYMOND E
CPC classification number: G02B13/00
Abstract: THE PRESENT INVENTION RELATES TO OPTICAL LENS SYSTEMS AND MORE PARTICULARLY TO A LENS SYSTEM HAVING VARIABLE MAGNIFICATION AND CONSTANT HIGH CORRECTION. THE LENS SYSTEM CONSISTS OF EIGHT LENS ELEMENTS AND CHANGES IN REDUCTION ARE PRODUCED
BY VARYING THE SHAPE OF ONE LENS ELEMENT AND CHANGING ONE AIRSPACE WHILE THE REMAINING LENS ELEMENTS AND AIR SPACES REMAIN CONSTANT.-
公开(公告)号:US3540800A
公开(公告)日:1970-11-17
申请号:US3540800D
申请日:1968-07-15
Applicant: IBM
Inventor: TIBBETTS RAYMOND E , WILCZYNSKI JANUSZ S
CPC classification number: G02B13/00
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公开(公告)号:US3575495A
公开(公告)日:1971-04-20
申请号:US3575495D
申请日:1969-10-27
Applicant: IBM
Inventor: TIBBETTS RAYMOND E , WILCZYNSKI JANUSZ S
CPC classification number: G02B13/24
Abstract: A lens is described having a high light gathering ability which may be employed in document reading and/or sorting machines. The lens includes five lens elements, a first biconvex lens element, a first meniscus lens element, a biconcave lens element, a second meniscus lens element and a second biconvex lens element.
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公开(公告)号:US3433558A
公开(公告)日:1969-03-18
申请号:US3433558D
申请日:1965-12-06
Applicant: IBM
Inventor: TIBBETTS RAYMOND E , WILCZYNSKI JANUSZ S
CPC classification number: H01S3/0602 , H01S3/08
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公开(公告)号:US3035490A
公开(公告)日:1962-05-22
申请号:US78433158
申请日:1958-12-31
Applicant: IBM
Inventor: TIBBETTS RAYMOND E
CPC classification number: G02B13/143 , G02B13/00
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公开(公告)号:US3572904A
公开(公告)日:1971-03-30
申请号:US3572904D
申请日:1969-05-05
Applicant: IBM
Inventor: TIBBETTS RAYMOND E , WILCZYNSKI JANUSZ S
CPC classification number: G02B13/00
Abstract: A lens group is described for use as a reduction lens. The lens group consists of eight lens elements. The first and second lens elements are meniscus singlet lenses. The third and fourth lens elements are cemented together to form a meniscus doublet lens. The fifth lens element is a negative meniscus singlet lens and the sixth and seventh lens elements are cemented together to form a meniscus doublet lens. The eighth lens element is a biconvex lens. The lens group has a high uniform resolution over the useable field, a flat image field with practically no zonal astigmatism, no mechanical vignetting, and virtually unmeasurable distortion.
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公开(公告)号:US3556642A
公开(公告)日:1971-01-19
申请号:US3556642D
申请日:1969-08-15
Applicant: IBM
Inventor: TIBBETTS RAYMOND E , WILCZYNSKI JANUSZ S
Abstract: A FIRST MICRO-OBJECTIVE LENS SYSTEM INCLUDING A FIRST LENS GROUP HAVING FOUR LENS ELEMENTS AND A SECOND LENS GROUP HAVING THREE LENS ELEMENTS AND A SECOND MICRO-OBJECTIVE LENS SYSTEM INCLUDING A FIRST LENS GROUP HAVING FOUR LENS ELEMENTS AND A SECOND LENS GROUP ALSO HAVING FOUR LENS ELEMENTS. THE FIRST LENS GROUP OF EACH SYSTEM FUNCTIONS TO CORRECT FOR IMAGES IN THE CENTER OF THE FIELD AND THE SECOND LENS GROUP FUNCTIONS TO CORRECT FOR IMAGES AT THE EDGE OF THE FIELD THUS PROVIDING A MICRO-OBJECTIVE LENS SYS-
TEM HAVING EXTREMELY HIGH RESOLUTION OVER A RELATIVELY SMALL FIELD. EIGHT EMBODIMENTS OF THE SECOND EIGHT ELEMENT LENS SYSTEM ARE PROVIDED TO ILLUSTRATE THAT THE ELEMENTS OF THE LENS SYSTEM ARE WITHIN SPECIFIED CONSTRUCTIONAL RANGES.-
公开(公告)号:DE69113715T2
公开(公告)日:1996-05-30
申请号:DE69113715
申请日:1991-08-05
Applicant: IBM
Inventor: GOODMAN DOUGLAS S , ROSENBLUTH ALAN E , TIBBETTS RAYMOND E , WILCZYNSKI JANUSZ S
IPC: G02B17/00 , G02B17/02 , G02B17/08 , G02B19/00 , G02B27/18 , G03F7/20 , H01L21/027 , H01L21/30 , H01S3/101 , G03B41/00 , G02B27/00 , G11B7/135
Abstract: An optical system having a plurality of substantially planar reflecting surfaces (10, 20, 36) and a plurality of curved reflecting surfaces (26, 28) providing an optical projection system which can scan a mask object (2) onto an image plane by having the mask (2) and copy substrate (42) substantially fixed in position relative to each other and either simultaneously moving the mask (2) and copy substrate (42) in the same direction or maintaining the mask (2) and image plane substantially stationary and fixed with respect to each other while scanning the optical system. The optical system uses one wavelength of an electromagnetic radiation to align the mask (2) to the copy substrate (42) and another wavelength of electromagnetic radiation to form the image of the mask (2) on the copy substrate (42). The apparatus can be used as a laser ablation optical tool to laser ablate the image of a mask (2) onto the copy substrate (42), as an inspection tool, as a photolithographic and for other related applications. The projection lens is a modified Dyson type lens.
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