公开(公告)号：US5552591B1

公开(公告)日：2000-05-02

申请号：US2129893

申请日：1993-02-22

Applicant: IBM

Inventor： BOSSEN DOUGLAS C ,  CHEN CHIN-LONG ,  DILL FREDERICK H ,  GOODMAN DOUGLAS S ,  HSIAO MU-YUE ,  MCCANN PAUL V ,  MULLIGAN JAMES M ,  RAND RICKY A

IPC: G06K1/12 ,  G06K7/016 ,  G06K7/10 ,  G06K19/06

CPC classification number: G06K7/10861 ,  G06K1/126 ,  G06K7/0166 ,  G06K19/06028 ,  G06K2019/06253

公开(公告)号：DE69113715T2

公开(公告)日：1996-05-30

申请号：DE69113715

申请日：1991-08-05

Applicant: IBM

Inventor： GOODMAN DOUGLAS S ,  ROSENBLUTH ALAN E ,  TIBBETTS RAYMOND E ,  WILCZYNSKI JANUSZ S

IPC: G02B17/00 ,  G02B17/02 ,  G02B17/08 ,  G02B19/00 ,  G02B27/18 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01S3/101 ,  G03B41/00 ,  G02B27/00 ,  G11B7/135

Abstract: An optical system having a plurality of substantially planar reflecting surfaces (10, 20, 36) and a plurality of curved reflecting surfaces (26, 28) providing an optical projection system which can scan a mask object (2) onto an image plane by having the mask (2) and copy substrate (42) substantially fixed in position relative to each other and either simultaneously moving the mask (2) and copy substrate (42) in the same direction or maintaining the mask (2) and image plane substantially stationary and fixed with respect to each other while scanning the optical system. The optical system uses one wavelength of an electromagnetic radiation to align the mask (2) to the copy substrate (42) and another wavelength of electromagnetic radiation to form the image of the mask (2) on the copy substrate (42). The apparatus can be used as a laser ablation optical tool to laser ablate the image of a mask (2) onto the copy substrate (42), as an inspection tool, as a photolithographic and for other related applications. The projection lens is a modified Dyson type lens.

公开(公告)号：DE69113715D1

公开(公告)日：1995-11-16

申请号：DE69113715

申请日：1991-08-05

Applicant: IBM

Inventor： GOODMAN DOUGLAS S ,  ROSENBLUTH ALAN E ,  TIBBETTS RAYMOND E ,  WILCZYNSKI JANUSZ S

IPC: G02B17/00 ,  G02B17/02 ,  G02B17/08 ,  G02B19/00 ,  G02B27/18 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01S3/101 ,  G03B41/00 ,  G02B27/00 ,  G11B7/135

Abstract: An optical system having a plurality of substantially planar reflecting surfaces (10, 20, 36) and a plurality of curved reflecting surfaces (26, 28) providing an optical projection system which can scan a mask object (2) onto an image plane by having the mask (2) and copy substrate (42) substantially fixed in position relative to each other and either simultaneously moving the mask (2) and copy substrate (42) in the same direction or maintaining the mask (2) and image plane substantially stationary and fixed with respect to each other while scanning the optical system. The optical system uses one wavelength of an electromagnetic radiation to align the mask (2) to the copy substrate (42) and another wavelength of electromagnetic radiation to form the image of the mask (2) on the copy substrate (42). The apparatus can be used as a laser ablation optical tool to laser ablate the image of a mask (2) onto the copy substrate (42), as an inspection tool, as a photolithographic and for other related applications. The projection lens is a modified Dyson type lens.

公开(公告)号：CA2011296A1

公开(公告)日：1990-11-15

申请号：CA2011296

申请日：1990-03-01

Applicant: IBM

Inventor： BOSSEN DOUGLAS C ,  CHEN CHIN L ,  DILL FREDERICK H ,  GOODMAN DOUGLAS S ,  HSIAO MU Y ,  MCCANN PAUL V ,  MULLIGAN JAMES M ,  RAND RICKY A

IPC: G06K1/12 ,  G06K7/016 ,  G06K7/10 ,  G06K19/06 ,  G06K1/00

Abstract: PRESENCE/ABSENCE BAR CODE A single width bar code exhibiting inherent self clocking characteristics is provided so as to be particularly useful in the identification of semiconductor wafers in very large scale integrated circuit manufacturing processes. The codes described herein are robust, reliable and highly readable even in the face of relatively high variations in scanning speed The codes are also desirably dense in terms of character representations per linear centimeter, an important consideration in semiconductor manufacturing wherein space on the chips and the wafer is at a premium. Additionally, a preferred embodiment of the present invention exhibits a minimum number for the maximum number of spaces between adjacent bars in code symbol sequences. P09-89-002