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公开(公告)号：US3924134A
公开(公告)日：1975-12-02
申请号：US52831274
申请日：1974-11-29
Applicant: IBM
Inventor： UMAN MYRON F , WINNARD JAMES R , WINTERS HAROLD F
Abstract: The ion source is comprised of two discharge chambers one of which is provided with a filament and an aperture leading into the other chamber which in turn has an extraction orifice. A low voltage arc discharge is operated in an inert gas atmosphere in the filament chamber while an arc of higher voltage is operated in the second ionization chamber which contains a vapor which will give the desired dopant ion species. The entire source is immersed in an axial magnetic field parallel to a line connecting the filament, the aperture between the two chambers and the extraction orifice.
Abstract translation: 离子源包括两个放电室，其中一个放电室设置有灯丝和通向另一个室的孔，该另一个室又具有抽出孔。 在灯丝室中的惰性气体气氛中操作低电压电弧放电，而在第二离子化室中操作较高电压的电弧，该第二电离室包含将产生所需掺杂剂离子种类的蒸气。 整个源被浸入平行于连接灯丝，两个室之间的孔和提取孔的线的轴向磁场。
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公开(公告)号：FR2293055A1
公开(公告)日：1976-06-25
申请号：FR7531451
申请日：1975-10-06
Applicant: IBM
Inventor： UMAN MYRON F , WINNARD JAMES R , WINTERS HAROLD F
Abstract: The ion source is comprised of two discharge chambers one of which is provided with a filament and an aperture leading into the other chamber which in turn has an extraction orifice. A low voltage arc discharge is operated in an inert gas atmosphere in the filament chamber while an arc of higher voltage is operated in the second ionization chamber which contains a vapor which will give the desired dopant ion species. The entire source is immersed in an axial magnetic field parallel to a line connecting the filament, the aperture between the two chambers and the extraction orifice.
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公开(公告)号：CA1039860A
公开(公告)日：1978-10-03
申请号：CA238428
申请日：1975-10-27
Applicant: IBM
Inventor： UMAN MYRON F , WINNARD JAMES R , WINTERS HAROLD F
Abstract: DOUBLE CHAMBER ION SOURCE The ion source is comprised of two discharge chambers one of which is provided with a filament and an aperture leading into the other chamber which in turn has an extraction orifice. A low voltage arc discharge is operated in an inert gas atmosphere in the filament chamber while an arc of higher voltage is operated in the second ionization chamber which contains a vapor which will give the desired dopant ion species. The entire source is immersed in an axial magnetic field parallel to a line connecting the filament, the aperture between the two chambers and the extraction orifice.
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公开(公告)号：DE2552783A1
公开(公告)日：1976-08-12
申请号：DE2552783
申请日：1975-11-25
Applicant: IBM
Inventor： UMAN MYRON F , WINNARD JAMES R , WINTERS HAROLD F
Abstract: The ion source is comprised of two discharge chambers one of which is provided with a filament and an aperture leading into the other chamber which in turn has an extraction orifice. A low voltage arc discharge is operated in an inert gas atmosphere in the filament chamber while an arc of higher voltage is operated in the second ionization chamber which contains a vapor which will give the desired dopant ion species. The entire source is immersed in an axial magnetic field parallel to a line connecting the filament, the aperture between the two chambers and the extraction orifice.
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